Languages
康富修
Overview
Works: | 1 works in 1 publications in 1 languages |
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Titles
光阻及底層材料在極紫外光微影13.5奈米照射下的光物理及光化學性質研究 = Photophysical and photochemical properties of photoresists and underlayer materials for extreme ultraviolet lithography upon irradiation at 13.5 nm
by:
國立高雄大學應用化學系碩士班; 康富修
(Language materials, printed)
, [撰]
Subjects