語系
Wang, Guilei.
概要
| 作品: | 1 作品在 1 項出版品 1 種語言 | |
|---|---|---|
書目資訊
Investigation on SiGe selective epitaxy for source and drain engineering in 22 nm CMOS technology node and beyond
by:
SpringerLink (Online service); Wang, Guilei.
(書目-電子資源)