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Inorganic and organometallic polymer...
~
Allcock, H. R.
Inorganic and organometallic polymers II :advanced materials and intermediates : developed from a symposium sponsored by the Division of Polymer Chemistry, Inc., at the 205th National Meeting of the American Chemical Society, Denver, Colorado, March 28-April 2, 1993 /
紀錄類型:
書目-語言資料,印刷品 : Monograph/item
正題名/作者:
Inorganic and organometallic polymers II :Patty Wisian-Neilson, editor, Harry R. Allcock, editor, Kenneth J. Wynne, editor.
其他題名:
advanced materials and intermediates : developed from a symposium sponsored by the Division of Polymer Chemistry, Inc., at the 205th National Meeting of the American Chemical Society, Denver, Colorado, March 28-April 2, 1993 /
其他作者:
Wisian-Neilson, Patty,
出版者:
Washington, DC :ACS,1994.
面頁冊數:
xiii, 536 p. :ill. ;24 cm.
叢書名:
ACS symposium series,
標題:
Inorganic polymersCongresses.
ISBN:
0841230366 :
Inorganic and organometallic polymers II :advanced materials and intermediates : developed from a symposium sponsored by the Division of Polymer Chemistry, Inc., at the 205th National Meeting of the American Chemical Society, Denver, Colorado, March 28-April 2, 1993 /
Inorganic and organometallic polymers II :
advanced materials and intermediates : developed from a symposium sponsored by the Division of Polymer Chemistry, Inc., at the 205th National Meeting of the American Chemical Society, Denver, Colorado, March 28-April 2, 1993 /Patty Wisian-Neilson, editor, Harry R. Allcock, editor, Kenneth J. Wynne, editor. - Washington, DC :ACS,1994. - xiii, 536 p. :ill. ;24 cm. - ACS symposium series,5720097-6156 ;.
Includes bibliographical references and indexes.
ISBN: 0841230366 :NT1580
LCCN: 94036598 Subjects--Topical Terms:
194895
Inorganic polymers
--Congresses.
LC Class. No.: QD196 / .I53 1994
Dewey Class. No.: 546
Inorganic and organometallic polymers II :advanced materials and intermediates : developed from a symposium sponsored by the Division of Polymer Chemistry, Inc., at the 205th National Meeting of the American Chemical Society, Denver, Colorado, March 28-April 2, 1993 /
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