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Reactive Sputter Deposition

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Depla, Diederik.

Reactive Sputter Deposition

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Reactive Sputter Depositionedited by Diederik Depla, Stijn Mahieu.
其他作者:	Depla, Diederik.
出版者:	Berlin, Heidelberg :Springer-Verlag Berlin Heidelberg,2008.
面頁冊數:	xviii, 570 p. :ill. (some col.), digital ;25 cm.
叢書名:	Springer Series in Materials Science,
Contained By:	Springer eBooks
標題:	Cathode sputtering (Plating process)
電子資源:	https://doi.org/10.1007/978-3-540-76664-3
ISBN:	9783540766629 (paper)

Reactive Sputter Deposition
Reactive Sputter Deposition[electronic resource] /edited by Diederik Depla, Stijn Mahieu. - Berlin, Heidelberg :Springer-Verlag Berlin Heidelberg,2008. - xviii, 570 p. :ill. (some col.), digital ;25 cm. - Springer Series in Materials Science,1090933-033X ;.

ISBN: 9783540766629 (paper)Subjects--Topical Terms:

283845
Cathode sputtering (Plating process)

Dewey Class. No.: 621.38152

Reactive Sputter Deposition
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650 # 0 $a Cathode sputtering (Plating process) $3 283845
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650 # 0 $a Chemistry. $3 188628
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650 # 0 $a Industrial Chemistry/Chemical Engineering. $3 273974
650 # 0 $a Physical Chemistry. $3 273698
650 # 0 $a Surfaces and Interfaces, Thin Films. $3 274441
700 0 # $a Depla, Diederik. $3 283843
700 0 # $a Mahieu, Stijn. $3 283844
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950 $a Chemistry and Materials Science (Springer-11644; ZDB-2-CMS)

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EB TK7871.88 D421 2008

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https://doi.org/10.1007/978-3-540-76664-3

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