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(1)光敏性薄膜在13.5奈米與6.7奈米的光源照下的光學性質與光蝕刻效...

國立高雄大學應用化學系碩士班

(1)光敏性薄膜在13.5奈米與6.7奈米的光源照下的光學性質與光蝕刻效應研究(2)固態胺基酸在可見光-真空紫外光區之吸收光譜 = (1)Optical properties and photoablation of photosensitive thin films upon 13.5 and 6.7 nm irradiation(2)VIS-VUV photoabsorption of amino acids in the solid state

紀錄類型:	書目-語言資料,印刷品 : 單行本
並列題名:	(1)Optical properties and photoablation of photosensitive thin films upon 13.5 and 6.7 nm irradiation(2)VIS-VUV photoabsorption of amino acids in the solid state
作者:	葉宸佑,
其他團體作者:	國立高雄大學
出版地:	[高雄市]
出版者:	撰者;
出版年:	2014[民103]
面頁冊數:	[139]面圖，表 : 30公分;
標題:	胺基酸
標題:	13.5 nm
電子資源:	http://handle.ncl.edu.tw/11296/ndltd/31009649742441904590
附註:	含參考書目
附註:	104年3月25日公開
摘要註:	(1) 本研究發展超越極紫外光(beyond extreme ultraviolet，BEUV)在6.7 nm 光源的鏡面反射儀技術，並以此技術測量 PMMA、加入及未加入光酸產生劑的 polystyrene/t-butylacrylate (GJH 和GJ)光阻的薄膜光學折射率(n)、光吸收係數(σabs) 、厚度(T)與密度(d)。將所量測的薄膜性質(d 與T)與X光反射儀(specular X-ray reflectometer，SXR)和極紫外光反射儀(specular EUV reflectometer，SEUVR)所得結果做比較，以確立 SBEUVR 量測技術的可行性。本研究以 SEUVR 與 SBEUVR 法進行臨場(in situ)曝光實驗，研究光剝蝕效應，包含光剝蝕速率與光源波長、薄膜厚度及薄膜材料組成的相關性，並由此推導出相對的釋氣速率，此速率值與本實驗室另一組研究所使用的四極桿質譜儀所量測的釋氣速率結果相符。(2) 本研究量測20種固態胺基酸樣品的光吸收光譜，而量測波長範圍從可見光(VIS)至真空紫外光(VUV)光源區段(400-130 nm)；VIS-UV光源為Jobin Yvon Horiba光譜儀進行測量，UV-VUV光源為國家同步輻射研究中心的BL03A-HF-CGM光束線。除此之外，本團隊改變實驗環境溫度，量測在不同溫度下的固態胺基酸吸收光譜。本研究成功量測20種胺基酸 VIS-VUV 光源區段的吸收光譜，根據支鏈上的官能基分為六大類，比對甚少的固態胺基酸於 VUV 光區的光吸收文獻能譜，藉此標定各種類型胺基酸支鏈上官能基吸收峰的相關性與差異，並提出溶液中胺基酸與固態胺基酸因分子間與分子內氫鍵造成的吸收光譜的異同，再進一步分析固態胺基酸吸收光譜中有 Carboxylate 與 Carboxyl 兩種官能基吸收峰強度比，可導出固態胺基酸分子與 Zwitterion 的平衡係數。 (1) We developed a vacuum-compatible specular reflectometer method using beyond-extreme-ultraviolet 6.7 nm light source (SBEUVR) to measure the refractive index (n), extinction coefficient (σabs), thin film thickness(T) and density(d) values of polymethylmethacrylate (PMMA), polystyrene/t-butylacrylate copolymer films with or without photoacid generator (denoted as GJH and GJ). Compared the thin film properties (d and T) measured by specular X-ray reflectometry and specular extreme ultraviolet reflectometry (SEUVR), we demonstrated that the SBEUVR technique is capable to measure BEUV optical property of photoresists accurately .SBEUVR was also used for conducting in situ exposure and actinic investigation on photoablation rates of PMMA, GJH and GJ thin-film samples against EUV and BEUV irradiation. The photoablation rates as functions of irradiation wavelengths, film thicknesses, and material compositions can be used to estimate resist outgassing rates, which agrees well with what had directly been measured by other workers in our group with a quadrupole mass spectrometer.(2) We measured VIS-VUV absorption spectra of 20 amino acids in solid states in the 400 to 130 nm wavelength region, and carried out temperature dependent measurements of the absorption using synchrotron light delivered from BL03A-HF-CGM at NSRRC and UV-VIS light source from Jobin Yvon Horiba spectrometer.The room-temperature absorption spectra are compared to sparse literature ones, and a good agreement is obtained. We classify photoabsorption bands of amino acids by their side-chain functional groups, and systematically identify photoabsorption features of the functional groups. By analyzing these spectra, the equilibrium constants of molecular amino acid and its Zwitterion form( carboxyl /carboxylate ) in solid is also derived.

(1)光敏性薄膜在13.5奈米與6.7奈米的光源照下的光學性質與光蝕刻效應研究(2)固態胺基酸在可見光-真空紫外光區之吸收光譜 = (1)Optical properties and photoablation of photosensitive thin films upon 13.5 and 6.7 nm irradiation(2)VIS-VUV photoabsorption of amino acids in the solid state
葉, 宸佑

(1)光敏性薄膜在13.5奈米與6.7奈米的光源照下的光學性質與光蝕刻效應研究(2)固態胺基酸在可見光-真空紫外光區之吸收光譜 = (1)Optical properties and photoablation of photosensitive thin films upon 13.5 and 6.7 nm irradiation(2)VIS-VUV photoabsorption of amino acids in the solid state / 葉宸佑撰 - [高雄市] : 撰者, 2014[民103]. - [139]面 ; 圖，表 ; 30公分.
含參考書目104年3月25日公開.
胺基酸13.5 nm

(1)光敏性薄膜在13.5奈米與6.7奈米的光源照下的光學性質與光蝕刻效應研究(2)固態胺基酸在可見光-真空紫外光區之吸收光譜 = (1)Optical properties and photoablation of photosensitive thin films upon 13.5 and 6.7 nm irradiation(2)VIS-VUV photoabsorption of amino acids in the solid state
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328 $a 碩士論文--國立高雄大學應用化學系碩士班
330 $a (1) 本研究發展超越極紫外光(beyond extreme ultraviolet，BEUV)在6.7 nm 光源的鏡面反射儀技術，並以此技術測量 PMMA、加入及未加入光酸產生劑的 polystyrene/t-butylacrylate (GJH 和GJ)光阻的薄膜光學折射率(n)、光吸收係數(σabs) 、厚度(T)與密度(d)。將所量測的薄膜性質(d 與T)與X光反射儀(specular X-ray reflectometer，SXR)和極紫外光反射儀(specular EUV reflectometer，SEUVR)所得結果做比較，以確立 SBEUVR 量測技術的可行性。本研究以 SEUVR 與 SBEUVR 法進行臨場(in situ)曝光實驗，研究光剝蝕效應，包含光剝蝕速率與光源波長、薄膜厚度及薄膜材料組成的相關性，並由此推導出相對的釋氣速率，此速率值與本實驗室另一組研究所使用的四極桿質譜儀所量測的釋氣速率結果相符。(2) 本研究量測20種固態胺基酸樣品的光吸收光譜，而量測波長範圍從可見光(VIS)至真空紫外光(VUV)光源區段(400-130 nm)；VIS-UV光源為Jobin Yvon Horiba光譜儀進行測量，UV-VUV光源為國家同步輻射研究中心的BL03A-HF-CGM光束線。除此之外，本團隊改變實驗環境溫度，量測在不同溫度下的固態胺基酸吸收光譜。本研究成功量測20種胺基酸 VIS-VUV 光源區段的吸收光譜，根據支鏈上的官能基分為六大類，比對甚少的固態胺基酸於 VUV 光區的光吸收文獻能譜，藉此標定各種類型胺基酸支鏈上官能基吸收峰的相關性與差異，並提出溶液中胺基酸與固態胺基酸因分子間與分子內氫鍵造成的吸收光譜的異同，再進一步分析固態胺基酸吸收光譜中有 Carboxylate 與 Carboxyl 兩種官能基吸收峰強度比，可導出固態胺基酸分子與 Zwitterion 的平衡係數。 (1) We developed a vacuum-compatible specular reflectometer method using beyond-extreme-ultraviolet 6.7 nm light source (SBEUVR) to measure the refractive index (n), extinction coefficient (σabs), thin film thickness(T) and density(d) values of polymethylmethacrylate (PMMA), polystyrene/t-butylacrylate copolymer films with or without photoacid generator (denoted as GJH and GJ). Compared the thin film properties (d and T) measured by specular X-ray reflectometry and specular extreme ultraviolet reflectometry (SEUVR), we demonstrated that the SBEUVR technique is capable to measure BEUV optical property of photoresists accurately .SBEUVR was also used for conducting in situ exposure and actinic investigation on photoablation rates of PMMA, GJH and GJ thin-film samples against EUV and BEUV irradiation. The photoablation rates as functions of irradiation wavelengths, film thicknesses, and material compositions can be used to estimate resist outgassing rates, which agrees well with what had directly been measured by other workers in our group with a quadrupole mass spectrometer.(2) We measured VIS-VUV absorption spectra of 20 amino acids in solid states in the 400 to 130 nm wavelength region, and carried out temperature dependent measurements of the absorption using synchrotron light delivered from BL03A-HF-CGM at NSRRC and UV-VIS light source from Jobin Yvon Horiba spectrometer.The room-temperature absorption spectra are compared to sparse literature ones, and a good agreement is obtained. We classify photoabsorption bands of amino acids by their side-chain functional groups, and systematically identify photoabsorption features of the functional groups. By analyzing these spectra, the equilibrium constants of molecular amino acid and its Zwitterion form( carboxyl /carboxylate ) in solid is also derived.
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