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PVD for microelectronicssputter depo...

Powell, Ronald A.

PVD for microelectronicssputter deposition applied to semiconductor manufacturing /

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	PVD for microelectronicsRonald A. Powell, Stephen M. Rossnagel.
其他題名:	sputter deposition applied to semiconductor manufacturing /
作者:	Powell, Ronald A.
其他作者:	Rossnagel, Stephen M.
出版者:	San Diego :Academic Press,c1999.
面頁冊數:	xiii, 419 p. :ill. ;24 cm.
標題:	Thin film devicesDesign and construction.
電子資源:	http://www.sciencedirect.com/science/book/9780125330268
ISBN:	9780125330268 (electronic bk.)

PVD for microelectronicssputter deposition applied to semiconductor manufacturing /
Powell, Ronald A.

PVD for microelectronicssputter deposition applied to semiconductor manufacturing /[electronic resource] :Ronald A. Powell, Stephen M. Rossnagel. - San Diego :Academic Press,c1999. - xiii, 419 p. :ill. ;24 cm. - Thin films ;v. 26 . - Thin films (San Diego, Calif.) ;v. 28..

Includes bibliographical references and indexes.

ISBN: 9780125330268 (electronic bk.) Subjects--Topical Terms:

203677
Thin film devices
--Design and construction.

LC Class. No.: QC176.A1 / P53 v.26

Dewey Class. No.: 621.3815/2

PVD for microelectronicssputter deposition applied to semiconductor manufacturing /
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