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Impact of ion implantation on quantu...
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Chakrabarti, Subhananda.
Impact of ion implantation on quantum dot heterostructures and devices
紀錄類型:
書目-電子資源 : Monograph/item
正題名/作者:
Impact of ion implantation on quantum dot heterostructures and devicesby Arjun Mandal, Subhananda Chakrabarti.
作者:
Mandal, Arjun.
其他作者:
Chakrabarti, Subhananda.
出版者:
Singapore :Springer Singapore :2017.
面頁冊數:
xxiii, 64 p. :ill., digital ;24 cm.
Contained By:
Springer eBooks
標題:
Quantum dots.
電子資源:
http://dx.doi.org/10.1007/978-981-10-4334-5
ISBN:
9789811043345$q(electronic bk.)
Impact of ion implantation on quantum dot heterostructures and devices
Mandal, Arjun.
Impact of ion implantation on quantum dot heterostructures and devices
[electronic resource] /by Arjun Mandal, Subhananda Chakrabarti. - Singapore :Springer Singapore :2017. - xxiii, 64 p. :ill., digital ;24 cm.
This book looks at the effects of ion implantation as an effective post-growth technique to improve the material properties, and ultimately, the device performance of In(Ga)As/GaAs quantum dot (QD) heterostructures. Over the past two decades, In(Ga)As/GaAs-based QD heterostructures have marked their superiority, particularly for application in lasers and photodetectors. Several in-situ and ex-situ techniques that improve material quality and device performance have already been reported. These techniques are necessary to maintain dot density and dot size uniformity in QD heterostructures and also to improve the material quality of heterostructures by removing defects from the system. While rapid thermal annealing, pulsed laser annealing and the hydrogen passivation technique have been popular as post-growth methods, ion implantation had not been explored largely as a post-growth method for improving the material properties of In(Ga)As/GaAs QD heterostructures. This work attempts to remedy this gap in the literature. The work also looks at introduction of a capping layer of quaternary alloy InAlGaAs over these In(Ga)As/GaAs QDs to achieve better QD characteristics. The contents of this volume will prove useful to researchers and professionals involved in the study of QDs and QD-based devices.
ISBN: 9789811043345$q(electronic bk.)
Standard No.: 10.1007/978-981-10-4334-5doiSubjects--Topical Terms:
204096
Quantum dots.
LC Class. No.: QC611.6.Q35
Dewey Class. No.: 621.38152
Impact of ion implantation on quantum dot heterostructures and devices
LDR
:02325nmm a2200313 a 4500
001
517604
003
DE-He213
005
20170602121611.0
006
m d
007
cr nn 008maaau
008
180316s2017 si s 0 eng d
020
$a
9789811043345$q(electronic bk.)
020
$a
9789811043338$q(paper)
024
7
$a
10.1007/978-981-10-4334-5
$2
doi
035
$a
978-981-10-4334-5
040
$a
GP
$c
GP
041
0
$a
eng
050
4
$a
QC611.6.Q35
072
7
$a
TJFD
$2
bicssc
072
7
$a
TEC021000
$2
bisacsh
072
7
$a
TEC008080
$2
bisacsh
082
0 4
$a
621.38152
$2
23
090
$a
QC611.6.Q35
$b
M271 2017
100
1
$a
Mandal, Arjun.
$3
787280
245
1 0
$a
Impact of ion implantation on quantum dot heterostructures and devices
$h
[electronic resource] /
$c
by Arjun Mandal, Subhananda Chakrabarti.
260
$a
Singapore :
$b
Springer Singapore :
$b
Imprint: Springer,
$c
2017.
300
$a
xxiii, 64 p. :
$b
ill., digital ;
$c
24 cm.
520
$a
This book looks at the effects of ion implantation as an effective post-growth technique to improve the material properties, and ultimately, the device performance of In(Ga)As/GaAs quantum dot (QD) heterostructures. Over the past two decades, In(Ga)As/GaAs-based QD heterostructures have marked their superiority, particularly for application in lasers and photodetectors. Several in-situ and ex-situ techniques that improve material quality and device performance have already been reported. These techniques are necessary to maintain dot density and dot size uniformity in QD heterostructures and also to improve the material quality of heterostructures by removing defects from the system. While rapid thermal annealing, pulsed laser annealing and the hydrogen passivation technique have been popular as post-growth methods, ion implantation had not been explored largely as a post-growth method for improving the material properties of In(Ga)As/GaAs QD heterostructures. This work attempts to remedy this gap in the literature. The work also looks at introduction of a capping layer of quaternary alloy InAlGaAs over these In(Ga)As/GaAs QDs to achieve better QD characteristics. The contents of this volume will prove useful to researchers and professionals involved in the study of QDs and QD-based devices.
650
0
$a
Quantum dots.
$3
204096
650
1 4
$a
Materials Science.
$3
273697
650
2 4
$a
Optical and Electronic Materials.
$3
274099
650
2 4
$a
Circuits and Systems.
$3
274416
650
2 4
$a
Electronic Circuits and Devices.
$3
495609
650
2 4
$a
Optics, Lasers, Photonics, Optical Devices.
$3
758151
650
2 4
$a
Signal, Image and Speech Processing.
$3
273768
700
1
$a
Chakrabarti, Subhananda.
$3
785200
710
2
$a
SpringerLink (Online service)
$3
273601
773
0
$t
Springer eBooks
856
4 0
$u
http://dx.doi.org/10.1007/978-981-10-4334-5
950
$a
Chemistry and Materials Science (Springer-11644)
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