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Spacer engineered FinFET architectur...
~
Dasgupta, Sudeb.
Spacer engineered FinFET architectures :high-performance digital circuit applications /
紀錄類型:
書目-語言資料,印刷品 : Monograph/item
正題名/作者:
Spacer engineered FinFET architectures :Brajesh Kumar Kaushik, Sudeb Dasgupta, Pankaj Kumar Pal.
其他題名:
high-performance digital circuit applications /
作者:
Kaushik, Brajesh Kumar.
其他作者:
Dasgupta, Sudeb.
出版者:
Boca Raton, FL :CRC Press, Taylor & Francis Group,c2017.
面頁冊數:
xvi, 138 p. :ill. (some col.) ;24 cm.
標題:
Metal oxide semiconductor field-effect transistors.
ISBN:
1498783597 (hbk.)
Spacer engineered FinFET architectures :high-performance digital circuit applications /
Kaushik, Brajesh Kumar.
Spacer engineered FinFET architectures :
high-performance digital circuit applications /Brajesh Kumar Kaushik, Sudeb Dasgupta, Pankaj Kumar Pal. - Boca Raton, FL :CRC Press, Taylor & Francis Group,c2017. - xvi, 138 p. :ill. (some col.) ;24 cm.
Includes bibliographical references and index.
Introduction to nanoelectronics -- Tri-gate FinFET technology and its advancement -- Dual-K spacer device architectures and its electrostatics -- Capacitive analysis & dual-K FinFET based digital circuit design -- Design metric improvement of dual-K based SRAM cell -- Statistical variability & sensitivity analysis.
ISBN: 1498783597 (hbk.)
LCCN: 2016051118Subjects--Topical Terms:
221791
Metal oxide semiconductor field-effect transistors.
LC Class. No.: TK7871.95 / .K21 2017
Dewey Class. No.: 621.3815/284
Spacer engineered FinFET architectures :high-performance digital circuit applications /
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