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Developments in surface contaminatio...

Kohli, Rajiv, (1947-)

Developments in surface contamination and cleaningcleaning techniques /

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Developments in surface contamination and cleaningedited by Rajiv Kohli and K.L. Mittal.
其他題名:	cleaning techniques /
其他作者:	Kohli, Rajiv,
出版者:	Amsterdam :William Andrew,2015.
面頁冊數:	1 online resource (235 p.)
標題:	Surfaces (Technology)
電子資源:	https://www.sciencedirect.com/science/book/9780323299619
ISBN:	9780323299619 (electronic bk.)

Developments in surface contamination and cleaningcleaning techniques /
Developments in surface contamination and cleaningcleaning techniques /[electronic resource] :edited by Rajiv Kohli and K.L. Mittal. - First edition. - Amsterdam :William Andrew,2015. - 1 online resource (235 p.) - Developments in Surface Contamination and Cleaning Series ;Volume 8. - Developments in Surface Contamination and Cleaning Series ;v. 8..

Includes bibliographical references and index.

As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R & D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography.

ISBN: 9780323299619 (electronic bk.)Subjects--Topical Terms:

190551
Surfaces (Technology)
Index Terms--Genre/Form:

214472
Electronic books.

LC Class. No.: TA418.7 .D876 2015 / 2015

Dewey Class. No.: 620.44

Developments in surface contamination and cleaningcleaning techniques /
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250 $a First edition.
260 $a Amsterdam : $b William Andrew, $c 2015.
300 $a 1 online resource (235 p.)
490 1 $a Developments in Surface Contamination and Cleaning Series ; $v Volume 8
504 $a Includes bibliographical references and index.
520 $a As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R & D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography.
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650 0 $a Particles $x Measurement. $3 662373
650 0 $a Cleaning. $3 646737
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650 0 $a Dust control. $3 549760
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700 1 $a Kohli, Rajiv, $d 1947- $3 646674
700 1 $a Mittal, K. L., $d 1945- $3 237632
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