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Metal impurities in silicon- and ger...
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Claeys, Cor.
Metal impurities in silicon- and germanium-based technologiesorigin, characterization, control, and device impact /
紀錄類型:
書目-電子資源 : Monograph/item
正題名/作者:
Metal impurities in silicon- and germanium-based technologiesby Cor Claeys, Eddy Simoen.
其他題名:
origin, characterization, control, and device impact /
作者:
Claeys, Cor.
其他作者:
Simoen, Eddy.
出版者:
Cham :Springer International Publishing :2018.
面頁冊數:
xxxiii, 438 p. :ill., digital ;24 cm.
Contained By:
Springer eBooks
標題:
MetalsInclusions.
電子資源:
https://doi.org/10.1007/978-3-319-93925-4
ISBN:
9783319939254$q(electronic bk.)
Metal impurities in silicon- and germanium-based technologiesorigin, characterization, control, and device impact /
Claeys, Cor.
Metal impurities in silicon- and germanium-based technologies
origin, characterization, control, and device impact /[electronic resource] :by Cor Claeys, Eddy Simoen. - Cham :Springer International Publishing :2018. - xxxiii, 438 p. :ill., digital ;24 cm. - Springer series in materials science,v.2700933-033X ;. - Springer series in materials science ;v. 62..
Preface -- Introduction -- Basic Properties of Metals in Semiconductors -- Sources of Metals in Si and Ge Processing -- Characterization and Detection of Metals in Silicon and Germanium -- Electrical Activity of Metals in Si and Ge -- Impact of Metals on Silicon Devices and Circuits -- Gettering and Passivation of Metals in Silicon and Germanium -- Modeling and Simulation of Metals in Silicon and Germanium -- Conclusions.
This book gives a unique review of different aspects of metallic contaminations in Si and Ge-based semiconductors. All important metals are discussed including their origin during crystal and/or device manufacturing, their fundamental properties, their characterization techniques and their impact on the electrical device performance. Several control and possible gettering approaches are addressed. The book is a reference for researchers and engineers studying advanced and state-of-the-art micro- and nano-electronic semiconductor devices and circuits. It has an interdisciplinary nature by combining different disciplines such as material science, defect engineering, device processing, defect and device characterization and device physics and engineering.
ISBN: 9783319939254$q(electronic bk.)
Standard No.: 10.1007/978-3-319-93925-4doiSubjects--Topical Terms:
664306
Metals
--Inclusions.
LC Class. No.: TA459 / .C534 2018
Dewey Class. No.: 620.16
Metal impurities in silicon- and germanium-based technologiesorigin, characterization, control, and device impact /
LDR
:02311nmm a2200337 a 4500
001
543613
003
DE-He213
005
20190225134215.0
006
m d
007
cr nn 008maaau
008
190430s2018 gw s 0 eng d
020
$a
9783319939254$q(electronic bk.)
020
$a
9783319939247$q(paper)
024
7
$a
10.1007/978-3-319-93925-4
$2
doi
035
$a
978-3-319-93925-4
040
$a
GP
$c
GP
041
0
$a
eng
050
4
$a
TA459
$b
.C534 2018
072
7
$a
TJFD
$2
bicssc
072
7
$a
TEC021000
$2
bisacsh
072
7
$a
TJFD
$2
thema
082
0 4
$a
620.16
$2
23
090
$a
TA459
$b
.C583 2018
100
1
$a
Claeys, Cor.
$3
821901
245
1 0
$a
Metal impurities in silicon- and germanium-based technologies
$h
[electronic resource] :
$b
origin, characterization, control, and device impact /
$c
by Cor Claeys, Eddy Simoen.
260
$a
Cham :
$b
Springer International Publishing :
$b
Imprint: Springer,
$c
2018.
300
$a
xxxiii, 438 p. :
$b
ill., digital ;
$c
24 cm.
490
1
$a
Springer series in materials science,
$x
0933-033X ;
$v
v.270
505
0
$a
Preface -- Introduction -- Basic Properties of Metals in Semiconductors -- Sources of Metals in Si and Ge Processing -- Characterization and Detection of Metals in Silicon and Germanium -- Electrical Activity of Metals in Si and Ge -- Impact of Metals on Silicon Devices and Circuits -- Gettering and Passivation of Metals in Silicon and Germanium -- Modeling and Simulation of Metals in Silicon and Germanium -- Conclusions.
520
$a
This book gives a unique review of different aspects of metallic contaminations in Si and Ge-based semiconductors. All important metals are discussed including their origin during crystal and/or device manufacturing, their fundamental properties, their characterization techniques and their impact on the electrical device performance. Several control and possible gettering approaches are addressed. The book is a reference for researchers and engineers studying advanced and state-of-the-art micro- and nano-electronic semiconductor devices and circuits. It has an interdisciplinary nature by combining different disciplines such as material science, defect engineering, device processing, defect and device characterization and device physics and engineering.
650
0
$a
Metals
$x
Inclusions.
$3
664306
650
0
$a
Semiconductors
$x
Materials.
$3
197826
650
1 4
$a
Optical and Electronic Materials.
$3
274099
650
2 4
$a
Microwaves, RF and Optical Engineering.
$3
274186
650
2 4
$a
Semiconductors.
$3
182134
650
2 4
$a
Electronic Circuits and Devices.
$3
495609
650
2 4
$a
Characterization and Evaluation of Materials.
$3
273978
700
1
$a
Simoen, Eddy.
$3
338528
710
2
$a
SpringerLink (Online service)
$3
273601
773
0
$t
Springer eBooks
830
0
$a
Springer series in materials science ;
$v
v. 62.
$3
438346
856
4 0
$u
https://doi.org/10.1007/978-3-319-93925-4
950
$a
Chemistry and Materials Science (Springer-11644)
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