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Development and applications of nega...

Dudnikov, Vadim.

Development and applications of negative ion sources

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Development and applications of negative ion sourcesby Vadim Dudnikov.
作者:	Dudnikov, Vadim.
出版者:	Cham :Springer International Publishing :2019.
面頁冊數:	xiv, 346 p. :ill. (some col.), digital ;24 cm.
Contained By:	Springer eBooks
標題:	Anions.
電子資源:	https://doi.org/10.1007/978-3-030-28437-4
ISBN:	9783030284374$q(electronic bk.)

Development and applications of negative ion sources
Dudnikov, Vadim.

Development and applications of negative ion sources[electronic resource] /by Vadim Dudnikov. - Cham :Springer International Publishing :2019. - xiv, 346 p. :ill. (some col.), digital ;24 cm. - Springer series on atomic, optical, and plasma physics,v.1101615-5653 ;. - Springer series on atomic, optical, and plasma physics ;66..

Chapter1: Introduction -- Chapter2: Charge exchange Technologies Control of Flow of accelerated particles -- Chapter3: Methods of negative ion beam production -- Chapter4: Surface Plasma Method for negative ion beam production -- Chapter5: Surface Plasma negative ion Sources -- Chapter6: Transportation of high brightness negative ion beams, space charge compensation, Instability -- Chapter7: General Remarks on the Surface Plasma Method of negative ion beams production -- Bibliography.

This book covers the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps.

ISBN: 9783030284374$q(electronic bk.)

Standard No.: 10.1007/978-3-030-28437-4doiSubjects--Topical Terms:

205760
Anions.

LC Class. No.: QC702.7.N4 / D836 2019

Dewey Class. No.: 541.372

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505 0 $a Chapter1: Introduction -- Chapter2: Charge exchange Technologies Control of Flow of accelerated particles -- Chapter3: Methods of negative ion beam production -- Chapter4: Surface Plasma Method for negative ion beam production -- Chapter5: Surface Plasma negative ion Sources -- Chapter6: Transportation of high brightness negative ion beams, space charge compensation, Instability -- Chapter7: General Remarks on the Surface Plasma Method of negative ion beams production -- Bibliography.
520 $a This book covers the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps.
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