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Chemical vapor deposition :thermal a...
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Sivaram, S.
Chemical vapor deposition :thermal and plasma deposition of electronic materials /
Record Type:
Language materials, printed : Monograph/item
Title/Author:
Chemical vapor deposition :S. Sivaram.
Reminder of title:
thermal and plasma deposition of electronic materials /
Author:
Sivaram, S.
Published:
New York :Van Nostrand Reinhold,c1995.
Description:
xii, 292 p. :ill. ;24 cm.
Subject:
Microelectronics industry.
ISBN:
0442010796 :
Chemical vapor deposition :thermal and plasma deposition of electronic materials /
Sivaram, S.
Chemical vapor deposition :
thermal and plasma deposition of electronic materials /S. Sivaram. - New York :Van Nostrand Reinhold,c1995. - xii, 292 p. :ill. ;24 cm.
Includes bibliographical references and index.
ISBN: 0442010796 :NT$3,998
LCCN: 94039696 Subjects--Topical Terms:
184281
Microelectronics industry.
LC Class. No.: TK7836 / S624 1995
Dewey Class. No.: 621.3815/2
Chemical vapor deposition :thermal and plasma deposition of electronic materials /
LDR
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19970108122022.0
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090528s1995 nyua 001 0 eng
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Sivaram, S.
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Chemical vapor deposition :
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thermal and plasma deposition of electronic materials /
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S. Sivaram.
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New York :
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c1995.
$b
Van Nostrand Reinhold,
300
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xii, 292 p. :
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ill. ;
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24 cm.
504
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Includes bibliographical references and index.
650
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Microelectronics industry.
$3
184281
650
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Chemical vapor deposition.
$3
184282
650
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Microelectronics
$x
Materials.
$3
184283
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西方語文圖書區(四樓)
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1 records • Pages 1 •
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320000048357
西方語文圖書區(四樓)
1圖書
一般圖書
TK7836 S624 1995
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1 records • Pages 1 •
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