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Principles of plasma discharges and materials processing /

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Principles of plasma discharges and materials processing /by Michael A. Lieberman and Allan J. Lichtenberg.
作者:	Lieberman, M. A.
其他作者:	Lichtenberg, Allan J.
出版者:	Hoboken, N.J. :Wiley,2005.
面頁冊數:	xxxv, 757 p. ;cm.
標題:	Plasma dynamics.
電子資源:	Authentication may be required:
ISBN:	0471720011 (acid-free paper)

Principles of plasma discharges and materials processing /
Lieberman, M. A.

Principles of plasma discharges and materials processing /[electronic resource] /by Michael A. Lieberman and Allan J. Lichtenberg. - 2nd ed. - Hoboken, N.J. :Wiley,2005. - xxxv, 757 p. ;cm.

Includes bibliographical references and index.

Electronic reproduction.
Somerset, New Jersey :
Wiley InterScience.

Available via World Wide Web.

ISBN: 0471720011 (acid-free paper)Subjects--Topical Terms:

225105
Plasma dynamics.
Subjects--Index Terms:

Electronic Materials.

LC Class. No.: QC718.5.D9 / L54 2005

Dewey Class. No.: 530.4/4

Principles of plasma discharges and materials processing /
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020 $a 0471720011 (acid-free paper)
020 $a 0471724254 (electronic bk.)
035 $a 00146738
040 $a JWS $d UtOrBLW
050 0 0 $a QC718.5.D9 $b L54 2005
082 0 0 $2 22 $a 530.4/4
100 0 $a Lieberman, M. A. $q (Michael A.) $3 439853
245 1 0 $a Principles of plasma discharges and materials processing / $c by Michael A. Lieberman and Allan J. Lichtenberg. $h [electronic resource] /
250 $a 2nd ed.
260 # $a Hoboken, N.J. : $c 2005. $b Wiley,
300 $a xxxv, 757 p. ; $c cm.
504 $a Includes bibliographical references and index.
533 $a Electronic reproduction. $b Somerset, New Jersey : $c Wiley InterScience. $n Available via World Wide Web.
650 # 0 $a Plasma dynamics. $3 225105
650 # 0 $a Thin films $x Surfaces. $3 225106
650 # 0 $a Plasma etching. $3 225107
650 # 0 $a Plasma chemistry $x Industrial applications. $3 225108
653 # # $a Electronic Materials.
700 0 # $a Lichtenberg, Allan J. $3 225104
710 0 # $a John Wiley & Sons. $3 209874
856 4 0 $a E-Books (Wiley) $u http://libsw.nuk.edu.tw/login?url=http://dx.doi.org/10.1002/0471724254 $z Authentication may be required:

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