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[ subject:"Plasma etching." ]
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Plasma etching processes for CMOS de...
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Posseme, Nicolas.
Plasma etching processes for CMOS device realization /
紀錄類型:
書目-語言資料,印刷品 : Monograph/item
正題名/作者:
Plasma etching processes for CMOS device realization /edited by Nicolas Posseme.
其他作者:
Posseme, Nicolas.
出版者:
London :ISTE Press Ltd ;2017.
面頁冊數:
x, 121 p. :ill. ;24 cm.
標題:
Metal oxide semiconductors, ComplementaryDesign and construction.
ISBN:
1785480960 (hbk.)
Plasma etching processes for CMOS device realization /
Plasma etching processes for CMOS device realization /
edited by Nicolas Posseme. - London :ISTE Press Ltd ;2017. - x, 121 p. :ill. ;24 cm. - Electronics engineering. - Electronics engineering series (London, England).
Includes bibliographical references and index.
ISBN: 1785480960 (hbk.) Subjects--Topical Terms:
184363
Metal oxide semiconductors, Complementary
--Design and construction.
LC Class. No.: TK7871.99.M44 / P715 2017
Dewey Class. No.: 621.39/732
Plasma etching processes for CMOS device realization /
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