國立高雄大學圖資館 |

語系: 繁體中文

說明(常見問題)

圖資館首頁

登入

回首頁 到查詢結果 [ subject:"Plasma etching." ]

切換: 標籤 | MARC模式 | ISBD

Plasma etching processes for CMOS de...

~

Posseme, Nicolas,

Plasma etching processes for CMOS device realization /

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Plasma etching processes for CMOS device realization /edited by Nicolas Posseme.
其他作者:	Posseme, Nicolas,
面頁冊數:	1 online resource (x, 121 pages) :illustrations
標題:	Metal oxide semiconductors, Complementary.
電子資源:	https://www.sciencedirect.com/science/book/9781785480966
ISBN:	9780081011966$q(electronic bk.)

Plasma etching processes for CMOS device realization /
Plasma etching processes for CMOS device realization /edited by Nicolas Posseme. - 1 online resource (x, 121 pages) :illustrations

Includes bibliographical references and index.

ISBN: 9780081011966$q(electronic bk.)Subjects--Topical Terms:

184467
Metal oxide semiconductors, Complementary.
Index Terms--Genre/Form:

214472
Electronic books.

LC Class. No.: TK7871.99.M44 / P63 2017

Dewey Class. No.: 621.39/732

Plasma etching processes for CMOS device realization /
LDR:01104nmm a2200277 i 4500 001 561551
006 m o d
007 cr cnu|unuuu||
008 200213s2017 enka ob 001 0 eng d
020 $a 9780081011966$q(electronic bk.)
020 $a 0081011962$q(electronic bk.)
020 $a 9781785480966$q(print)
020 $a 1785480960$q(print)
035 $a (OCoLC)970659018
035 $a els108120287
040 $a N $b eng $e rda $e pn $c N $d EBLCP $d OPELS $d IDEBK $d N $d UAB $d UIU $d OCLCF $d YDX $d WAU $d OTZ $d OCLCQ $d UPM $d MERUC $d U3W $d OCLCQ $d CNCGM $d LQU
041 0 $a eng
050 0 0 $a TK7871.99.M44 $b P63 2017
082 0 4 $a 621.39/732 $2 23
245 0 0 $a Plasma etching processes for CMOS device realization / $c edited by Nicolas Posseme.
264 1 $a London, UK : $b ISTE Press ; $a Kidlington, Oxford, UK : $b Elsevier, $c 2017.
300 $a 1 online resource (x, 121 pages) : $b illustrations
336 $a text $b txt $2 rdacontent
337 $a computer $b c $2 rdamedia
338 $a online resource $b cr $2 rdacarrier
504 $a Includes bibliographical references and index.
650 0 $a Metal oxide semiconductors, Complementary. $3 184467
650 0 $a Plasma etching. $3 225107
655 4 $a Electronic books. $2 local. $3 214472
700 1 $a Posseme, Nicolas, $e editor. $3 845819
856 4 0 $u https://www.sciencedirect.com/science/book/9781785480966

筆 0 讀者評論

館藏

1 筆 • 頁數 1 •
1

館藏流通類別

000000172948

電子館藏

1圖書

電子書

EB TK7871.99.M44 P63 2017

一般使用(Normal)

在架

0

1 筆 • 頁數 1 •
1

多媒體

多媒體檔案
https://www.sciencedirect.com/science/book/9781785480966

評論

新增評論分享你的心得

Export

取書館別

變更密碼

登入