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Search result for [ author_sort:"康富修"]

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光阻及底層材料在極紫外光微影13.5奈米照射下的光物理及光化學性質研究 ...

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國立高雄大學應用化學系碩士班
- 光阻及底層材料在極紫外光微影13.5奈米照射下的光物理及光化學性質研究 = Photophysical and photochemical properties of photoresists and underlayer materials for extreme ultraviolet lithography upon irradiation at 13.5 nm
- by: 國立高雄大學應用化學系碩士班; 康富修
- Language materials, printed : monographic
- Language: 中文
- Publisher: 撰者
- Place of Publication: [高雄市]
- Year of Publication: 2010
- Availability: 2 Copie(s) available | 2 Copie(s) available for loan
- based on 0 review(s)

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