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Design, fabrication, and optical analysis of nanomirrors for maskless EUV lithography

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Design, fabrication, and optical analysis of nanomirrors for maskless EUV lithography
作者:	Shroff, Yashesh Ajitbhai.
面頁冊數:	153 p.
附註:	Chair: William G. Oldham.
附註:	Source: Dissertation Abstracts International, Volume: 65-02, Section: B, page: 0941.
Contained By:	Dissertation Abstracts International65-02B.
標題:	Engineering, Electronics and Electrical.
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3121699
ISBN:	0496690507

Design, fabrication, and optical analysis of nanomirrors for maskless EUV lithography
Shroff, Yashesh Ajitbhai.

Design, fabrication, and optical analysis of nanomirrors for maskless EUV lithography [electronic resource] - 153 p.

Chair: William G. Oldham.

Thesis (Ph.D.)--University of California, Berkeley, 2003.

Mirror based pattern generation is studied to provide an understanding of how they can be operated in an analog mode to meet the quasi-continuous sizing and placement requirements of optical lithography. A general model using only three parameters, light coherence, #spots/minimum feature, and k1 resolution parameter is developed to understand parameter heavy nanomirror imaging. While a single mirror 'spot' is designed to not resolve, two or more spots with an optical path difference (OPD) between 0 and ½ lambda are shown to generate grayscaled patterns.

ISBN: 0496690507Subjects--Topical Terms:

226981
Engineering, Electronics and Electrical.

Design, fabrication, and optical analysis of nanomirrors for maskless EUV lithography
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500 $a Source: Dissertation Abstracts International, Volume: 65-02, Section: B, page: 0941.
502 $a Thesis (Ph.D.)--University of California, Berkeley, 2003.
520 # $a Mirror based pattern generation is studied to provide an understanding of how they can be operated in an analog mode to meet the quasi-continuous sizing and placement requirements of optical lithography. A general model using only three parameters, light coherence, #spots/minimum feature, and k1 resolution parameter is developed to understand parameter heavy nanomirror imaging. While a single mirror 'spot' is designed to not resolve, two or more spots with an optical path difference (OPD) between 0 and ½ lambda are shown to generate grayscaled patterns.
520 # $a Normalized image log slope (NILS) of piston mirror edges is higher than tilt and marginally lower than attenuated PSM. Overtilted (OPD >1/2 lambda) mirrors and pseudo-tilt (aka double-piston) mirrors perform better than piston mirrors for isolated spaces. For isolated lines, attenuated PSM is marginally better than tilt and piston mirrors. Off-grid slope degradation is observed for both modulation schemes. Defocus related image shift is observed and attributed to asymmetric wavefront reflected from mirrors. Image shift, which can be a serious concern in optical lithography, is more prominent in piston than tilt mirrors. A 'double-piston' mirror design is proposed which reduces shift to tilting mirror level and also provides the large process-window of piston mirrors.
520 # $a This thesis explores the feasibility of substituting an array of modulatable mirrors for mask in optical lithography. We have concentrated particularly on EUV wavelengths and thus the use of very small mirrors, from 1 to several micrometers on an edge. Both tilting and piston motion has been studied as a means of modulation. We have fabricated arrays of mirrors 3--5um on an edge and <300nm gap. The structural material is amorphous-SiGe with &sim;55% Ge content allowing it to be conductive in a low thermal budget. The sacrificial layer is Ge. Highest temperature seen by the devices is 450deg C making the mirror array compatible with future integration with logic and memory on the same die.
520 # $a Under low k1 conditions (in which sub resolution features are added to conventional mask patterns to achieve "optical proximity correction") it is possible to perform an analogous OPC by adjusting the tilts of all the mirrors in the vicinity of the densely patterned region. In other words the image is optimized for some property, for example to achieve the target critical dimension at one or more points along a line. A simple optimization algorithm is been demonstrated based on the Newton-Raphson method. Aerial image of off-grid, minimum sized, orthogonal, and densely packed features with up to 7 target critical points is placed within CD/60 tolerance.
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710 0 # $a University of California, Berkeley. $3 212474
773 0 # $g 65-02B. $t Dissertation Abstracts International
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790 1 0 $a Oldham, William G., $e advisor
791 $a Ph.D.
792 $a 2003
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