非極性a平面氮化鎵和(11-22)半極性氮化銦鎵/氮化鎵多重量子井之異向...
國立高雄大學應用物理學系碩士班

 

  • 非極性a平面氮化鎵和(11-22)半極性氮化銦鎵/氮化鎵多重量子井之異向性質與氮極性氮化鎵低溫緩衝層生長時間對於樣品品質的影響之研究 = Investigations of the Anisotropic Property of Nonpolar a-plane GaN,(11-22) Semipolar InGaN/GaN Multiple Quantum Wells and the Effects of Growth Time of Low-Temperature Buffer Layer on the Sample Quality of N-polar GaN
  • 紀錄類型: 書目-語言資料,印刷品 : 單行本
    並列題名: Investigations of the Anisotropic Property of Nonpolar a-plane GaN,(11-22) Semipolar InGaN/GaN Multiple Quantum Wells and the Effects of Growth Time of Low-Temperature Buffer Layer on the Sample Quality of N-polar GaN
    作者: 陳佑瑜,
    其他團體作者: 國立高雄大學
    出版地: [高雄市]
    出版者: 撰者;
    出版年: 民100
    面頁冊數: 130葉部份彩圖,表格 : 30公分;
    標題: 氮極性氮化鎵
    標題: N-polar GaN
    電子資源: http://handle.ncl.edu.tw/11296/ndltd/90832730299806589742
    附註: 參考書目:葉13-15
    附註: 內容為英文
    摘要註: 本論文討論氮極性氮化鎵、非極性a平面氮化鎵成長在r平面的藍寶石基板上、與(11-22)半極性多量子井樣品的異向性質,此三類樣品皆由有機金屬氣相沉積法生長。樣品的光學的品質是利用光激螢光(PL)、時間解析光激螢光系統(TRPL)、原子力顯微鏡(AFM)、場發射電子顯微鏡(FE-SEM)和陰極發光系統(CL)來測量。首先,我們探討成長不同的低溫緩衝層時間(114、120和180秒),對氮極性氮化鎵樣品的光學性質之影響。低溫緩衝層成長時間較長,光學品質會下降且會有較粗糙的表面。此外,我們也探討光致螢光光譜之波峰位置不同與應力有關。第二,探討非極性a平面氮化鎵成長於r平面的藍寶石基板上,在不同厚度的第一步a平面氮化鎵條件下的樣品,對於非極性a平面氮化鎵樣品,在陰極發光光譜中,主要發光位置在波長365奈米,這與部分差排終止於堆疊差排有關,且在光激螢光光譜中,有兩個主要的發光波峰在波長355和363奈米,分別是來自於近能帶發光和堆疊差排。第三,對於(11-22)半極性多量子井氮化銦鎵/氮化鎵樣品,在光激螢光光譜中,會有一個主要的波峰在波長403奈米左右來自於氮化銦鎵,其它微弱的發光波峰則是屬於氮化鎵的訊號。樣品有較強的陰極發光時,會觀察到表面有較大條紋且粗糙的表面形貌。 This thesis studies the anisotropic properties of N-polar GaN, nonpolar a-plane GaN, and (11-22) semipolar InGaN/GaN MQW samples grown by MOVCD. The optical and material properties were investigated by photoluminescence (PL), and time-resolved PL measurements, atomic force microscopy (AFM), field-emission electron microscopy (FE-SEM), and cathodoluminescence (CL). First, for N-polar GaN samples, we study the effects of the buffer layer growth times on the material and optical properties of three N-polar GaN samples with different growth times (114, 120, and 180 seconds) of low temperature (LT) buffer layer. As the growth time of the low temperature buffer increases, the PL and CL intensities decrease, due to a rougher surface morphology. Also, the stress is associated with PL peak position by Raman scattering.Second, we study nonpolar a-plane GaN on r-sapphire with the different thickness first-step a-GaN. For nonpolar a-plane GaN samples, the main peak (~365 nm) in the CL spectrum is associated with the partial dislocation terminating basal stacking faults (BSFs) and two main peaks around ~355 nm and ~363 nm in PL the spectrum are attributed to near-band-edge (NBE) emission and BSFs, respectively. Third, for (11-22) semipolar InGaN/GaN MQW samples, the main peak around ~403 nm is the InGaN-related emission, while the other weak peaks are the GaN-related emission in the PL Spectrum. As the sample has the stronger CL luminescence, the striation feature with a rougher surface morphology can be observed.
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310002134537 博碩士論文區(二樓) 不外借資料 學位論文 TH 008M/0019 423203 7521 2011 一般使用(Normal) 在架 0
310002134545 博碩士論文區(二樓) 不外借資料 學位論文 TH 008M/0019 423203 7521 2011 c.2 一般使用(Normal) 在架 0
  • 2 筆 • 頁數 1 •
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