Metal oxide semiconductor field-effect transistors.
Overview
Works: | 26 works in 14 publications in 14 languages |
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Titles
Hf-based high-k dielectrics :process development, performance characterization, and reliability /
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(Language materials, printed)
Distributed CMOS bidirectional amplifiersbroadbanding and linearization techniques /
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(Electronic resources)
Fundamentals of bias temperature instability in MOS transistorscharacterization methods, process and materials impact, DC and AC modeling /
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(Electronic resources)
Growth of high permittivity dielectrics by high pressure sputtering from metallic targets
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(Electronic resources)
Spacer engineered FinFET architectures :high-performance digital circuit applications /
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(Language materials, printed)
Model and design of improved current mode logic gatesdifferential and single-ended /
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(Electronic resources)
Charge transport in low dimensional semiconductor structuresthe maximum entropy approach /
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(Electronic resources)
Circadian rhythms for future resilient electronic systemsaccelerated active self-healing for integrated circuits /
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(Electronic resources)
High-k gate dielectric materials :applications with advanced metal oxide semiconductor field effect transistors (MOSFETs) /
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(Language materials, printed)
Differentiated layout styles for MOSFETselectrical behavior in harsh environments /
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(Electronic resources)
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