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利用雷射濺鍍AlN高介電材料於MIS元件結構之光電特性量測研究 = Th...

江秉儒

利用雷射濺鍍AlN高介電材料於MIS元件結構之光電特性量測研究 = The Study of the AlN Thin Film Deposition by Excimer Laser Sputtering and Its Characterizations of MIS device

Record Type:	Language materials, printed : monographic
Paralel Title:	The Study of the AlN Thin Film Deposition by Excimer Laser Sputtering and Its Characterizations of MIS device
Author:	江秉儒,
Place of Publication:	[高雄市]
Published:	撰者;
Year of Publication:	2007[民96]
Description:	[1], 79葉圖，表 : 30公分;
Subject:	氮化鋁
Online resource:	http://handle.ncl.edu.tw/11296/ndltd/30813816099021423655
Notes:	指導教授：施明昌
Notes:	參考書目：葉77-79

利用雷射濺鍍AlN高介電材料於MIS元件結構之光電特性量測研究 = The Study of the AlN Thin Film Deposition by Excimer Laser Sputtering and Its Characterizations of MIS device
江, 秉儒

利用雷射濺鍍AlN高介電材料於MIS元件結構之光電特性量測研究 = The Study of the AlN Thin Film Deposition by Excimer Laser Sputtering and Its Characterizations of MIS device / 江秉儒撰 - [高雄市] : 撰者, 2007[民96]. - [1], 79葉 ; 圖，表 ; 30公分.
指導教授：施明昌參考書目：葉77-79.
氮化鋁

利用雷射濺鍍AlN高介電材料於MIS元件結構之光電特性量測研究 = The Study of the AlN Thin Film Deposition by Excimer Laser Sputtering and Its Characterizations of MIS device
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