國立高雄大學圖資館 |

Language: English

Back

Thermal effects in photomask engineering and nano-thermometry

Record Type:	Electronic resources : Monograph/item
Title/Author:	Thermal effects in photomask engineering and nano-thermometry
Author:	Chu, Dachen.
Description:	108 p.
Notes:	Adviser: R. Fabian W. Pease.
Notes:	Source: Dissertation Abstracts International, Volume: 65-04, Section: B, page: 1917.
Contained By:	Dissertation Abstracts International65-04B.
Subject:	Physics, Condensed Matter.
Online resource:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3128632
ISBN:	0496758942

Thermal effects in photomask engineering and nano-thermometry
Chu, Dachen.

Thermal effects in photomask engineering and nano-thermometry [electronic resource] - 108 p.

Adviser: R. Fabian W. Pease.

Thesis (Ph.D.)--Stanford University, 2004.

A Green's function approach has been developed to calculate four-dimensional temperature profiles in complex structures such as the multi-layer work-pieces being exposed in EBL. The model is being used to characterize different ebeam writing strategies to find the optimum.

ISBN: 0496758942Subjects--Topical Terms:

226939
Physics, Condensed Matter.

Thermal effects in photomask engineering and nano-thermometry
LDR:02850nmm _2200313 _450 001 162629
005 20051017073506.5
008 230606s2004 eng d
020 $a 0496758942
035 $a 00149130
035 $a 162629
040 $a UnM $c UnM
100 0 $a Chu, Dachen. $3 227773
245 1 0 $a Thermal effects in photomask engineering and nano-thermometry $h [electronic resource]
300 $a 108 p.
500 $a Adviser: R. Fabian W. Pease.
500 $a Source: Dissertation Abstracts International, Volume: 65-04, Section: B, page: 1917.
502 $a Thesis (Ph.D.)--Stanford University, 2004.
520 # $a A Green's function approach has been developed to calculate four-dimensional temperature profiles in complex structures such as the multi-layer work-pieces being exposed in EBL. The model is being used to characterize different ebeam writing strategies to find the optimum.
520 # $a Electron Beam Lithography (EBL) in photomask fabrication results in heating of the resist films. The local heating can change the chemical properties of resist, leading to placement errors. The heating induced error has been believed to be increasingly significant as the transistor minimum feature size approaches the sub 100 nm region.
520 # $a Gold/nickel thin film thermocouples with minimum junction area of 100nm by 100nm were fabricated and calibrated. These thermocouple demonstrated a 400ns response time when heated by a 10ns laser pulse. Using these nano thermocouples, transient resist heating temperature profiles were for the first time measured at room temperature. Experimental results showed a good agreement with the Green's function model. We also observed a tradeoff in the scaling of thermocouple sensors. The smaller thermocouples may provide higher spatial and temporal resolutions but have poorer temperature resolution.
520 # $a In conclusion, we both modeled and measured the resist heating in EBL. In short exposure time (&sim;1us or less) the resist heating is nearly adiabatic, while in longer time the heating is dominated by substrate. Nano scale metallic thermocouples were explored and tradeoff was observed in dimension scaling.
520 # $a To provide the parameters for the model, two independent techniques have been employed: a thin film electrode method and a laser thermal-reflectance method. Unlike earlier results from polyimide films, no appreciable anisotropy was observed in thermal conductivities for the polymeric resists tested.
590 $a School code: 0212.
650 # 0 $a Physics, Condensed Matter. $3 226939
690 $a 0611
710 0 # $a Stanford University. $3 212607
773 0 # $g 65-04B. $t Dissertation Abstracts International
790 $a 0212
790 1 0 $a Pease, R. Fabian W., $e advisor
791 $a Ph.D.
792 $a 2004
856 4 0 $u http://libsw.nuk.edu.tw/login?url=http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3128632 $z http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3128632