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Dry etching for VLSI /

~

Baggerman, J. A. G.

Dry etching for VLSI /

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Dry etching for VLSI /A. J. van Roosmalen, J. A. G. Baggerman, S. J. H. Brader.
Author:	Roosmalen, A. J. van.
other author:	Brader, S. J. H.
Published:	New York :Plenum Press,c1991.
Description:	xvii, 237 p. :ill. ;27 cm.
Series:	Updates in applied physics and electrical technology
Subject:	SemiconductorsEtching.
ISBN:	9780306438356 (hbk.)

Dry etching for VLSI /
Roosmalen, A. J. van.

Dry etching for VLSI /A. J. van Roosmalen, J. A. G. Baggerman, S. J. H. Brader. - New York :Plenum Press,c1991. - xvii, 237 p. :ill. ;27 cm. - Updates in applied physics and electrical technology.

Includes bibliographical references (p. 157-175) and index.

ISBN: 9780306438356 (hbk.)

LCCN: 91007385 Subjects--Topical Terms:

245859
Semiconductors
--Etching.

LC Class. No.: TK7871.85 / .R58 1991

Dewey Class. No.: 621.381/52

Dry etching for VLSI /
LDR:00666pam 22001934a 450 001 182023
005 19911004104640.4
008 090528s1991 nyua b 001 0 eng
010 $a 91007385
020 $a 9780306438356 (hbk.)
020 $a 0306438356 (hbk.) : $c NT6624
035 $a 00322145
040 $a DLC $c DLC $d DLC
050 0 0 $a TK7871.85 $b .R58 1991
082 0 0 $2 20 $a 621.381/52
100 $a Roosmalen, A. J. van. $3 266902
245 1 0 $a Dry etching for VLSI / $c A. J. van Roosmalen, J. A. G. Baggerman, S. J. H. Brader.
260 $a New York : $c c1991. $b Plenum Press,
300 $a xvii, 237 p. : $b ill. ; $c 27 cm.
440 0 $a Updates in applied physics and electrical technology
504 $a Includes bibliographical references (p. 157-175) and index.
650 $a Semiconductors $x Etching. $3 245859
650 $a Integrated circuits $x Very large scale integration $x Design and construction. $3 182089
650 $a Plasma etching. $3 225107
700 $a Brader, S. J. H. $3 266901
700 $a Baggerman, J. A. G. $3 266900

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320000470312

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TK7871.85 R781 1991

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1 records • Pages 1 •
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