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Plasma properties, deposition and et...
~
Alterowitz, Samuel A.
Plasma properties, deposition and etching /
Record Type:
Language materials, printed : Monographic component part
Title/Author:
Plasma properties, deposition and etching /editors, J. J. Pouch and S. A. Alterovitz.
other author:
Pouch, John J.
Published:
Aedermannsdorf, Switzerland :Trans Tech Publications,c1993.
Description:
x, 742 p. :ill. ;25 cm.
Series:
Materials science forum,
Subject:
Plasma dynamics.
ISBN:
9780878496709 (pbk.)
Plasma properties, deposition and etching /
Plasma properties, deposition and etching /
editors, J. J. Pouch and S. A. Alterovitz. - Aedermannsdorf, Switzerland :Trans Tech Publications,c1993. - x, 742 p. :ill. ;25 cm. - Materials science forum,v. 140-1420255-5476 ;.
Includes bibliographical references and index.
ISBN: 9780878496709 (pbk.)Subjects--Topical Terms:
225105
Plasma dynamics.
LC Class. No.: QC718.5.D9 / P53 1993
Plasma properties, deposition and etching /
LDR
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20060416235200.0
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090528s1993 sz a b 001 0 eng
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9780878496709 (pbk.)
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087849670X (pbk.) :
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NT8480
035
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00322152
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Uk
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Uk
050
4
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QC718.5.D9
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P53 1993
245
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Plasma properties, deposition and etching /
$c
editors, J. J. Pouch and S. A. Alterovitz.
260
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Aedermannsdorf, Switzerland :
$c
c1993.
$b
Trans Tech Publications,
300
$a
x, 742 p. :
$b
ill. ;
$c
25 cm.
440
0
$a
Materials science forum,
$v
v. 140-142
$x
0255-5476 ;
504
$a
Includes bibliographical references and index.
650
$a
Plasma dynamics.
$3
225105
650
$a
Plasma etching.
$3
225107
650
$a
Plasma diagnostics.
$3
234854
700
$a
Pouch, John J.
$3
266917
700
$a
Alterowitz, Samuel A.
$3
266918
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320000470387
西方語文圖書區(四樓)
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QC718.5.D9 P715 1993
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