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Ferroelectric Thin FilmsBasic Proper...
~
Ishibashi, Yoshihiro.
Ferroelectric Thin FilmsBasic Properties and Device Physics for Memory Applications /
Record Type:
Electronic resources : Monograph/item
Title/Author:
Ferroelectric Thin Filmsedited by Yoshihiro Ishibashi, Masanori Okuyama.
Reminder of title:
Basic Properties and Device Physics for Memory Applications /
other author:
Okuyama, Masanori.
Published:
Berlin Heidelberg :Springer-Verlag GmbH.,2005
Description:
xiii, 244 p. :ill., digital ;24 cm.
Series:
Topics in Applied Physics,
Contained By:
Springer e-books
Subject:
Thin films.
Online resource:
http://dx.doi.org/10.1007/b99517
ISBN:
9783540241638 (paper)
Ferroelectric Thin FilmsBasic Properties and Device Physics for Memory Applications /
Ferroelectric Thin Films
Basic Properties and Device Physics for Memory Applications /[electronic resource] :edited by Yoshihiro Ishibashi, Masanori Okuyama. - Berlin Heidelberg :Springer-Verlag GmbH.,2005 - xiii, 244 p. :ill., digital ;24 cm. - Topics in Applied Physics,980303-4216 ;.
ISBN: 9783540241638 (paper)Subjects--Topical Terms:
203678
Thin films.
LC Class. No.: TA418.9.T45 / F465 2005
Dewey Class. No.: 621.39/732
Ferroelectric Thin FilmsBasic Properties and Device Physics for Memory Applications /
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Ferroelectric Thin Films
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Basic Properties and Device Physics for Memory Applications /
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edited by Yoshihiro Ishibashi, Masanori Okuyama.
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[electronic resource] :
260
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Berlin Heidelberg :
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2005
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Springer-Verlag GmbH.,
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xiii, 244 p. :
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ill., digital ;
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24 cm.
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Topics in Applied Physics,
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Thin films.
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Ferroelectricity.
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Physics.
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Crystallography.
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Electronics and Microelectronics, Instrumentation.
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# 0
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Magnetism, Magnetic Materials.
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Metallic Materials.
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274455
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Physics and Applied Physics in Engineering.
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Okuyama, Masanori.
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Ishibashi, Yoshihiro.
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Springer e-books
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http://libsw.nuk.edu.tw:81/login?url=http://dx.doi.org/10.1007/b99517
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http://dx.doi.org/10.1007/b99517
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Physics and Astronomy (Springer-11651; ZDB-2-PHA)
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電子館藏
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EB TA418.9.T45 F395 2005
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1 records • Pages 1 •
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http://libsw.nuk.edu.tw:81/login?url=http://dx.doi.org/10.1007/b99517
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