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微奈米壓印用之塑膠模具及壓印材料之開發 = Development of...

國立高雄大學化學工程及材料工程學系碩士班

微奈米壓印用之塑膠模具及壓印材料之開發 = Development of plastic molds and imprinted materials for micro/nano imprint lithography

紀錄類型:	書目-語言資料,印刷品 : 單行本
並列題名:	Development of plastic molds and imprinted materials for micro/nano imprint lithography
作者:	許淑涵,
其他團體作者:	國立高雄大學
出版地:	[高雄市]
出版者:	撰者;
出版年:	2009[民98]
面頁冊數:	166面圖、表 : 30公分;
標題:	塑膠混合模具
標題:	hierarchical structure
電子資源:	http://handle.ncl.edu.tw/11296/ndltd/93198790930795450012
附註:	指導教授：鍾宜璋
附註:	參考書目：面
摘要註:	本論文研究壓印技術的開發，研究分為三個部份：包含壓印用模具之開發、壓印製程開發以及壓印材料之開發。壓印用模具之開發又分為兩部份，一是製作塑膠混合模具，二是製作規則孔洞薄膜。首先，在塑膠混合模具方面，擬製作凸面具有擋光層之塑膠模具，可應用於無殘餘層圖案製備。方法為利用碳黑、銀或金當作擋光層。以碳黑為擋光層之塑膠混合模具尺寸極限受限於碳黑自身聚集粒徑，本研究可利用碳黑製作20μm塑膠混合模具。以銀為擋光層之塑膠混合模具作法是將銀離子經無電電鍍還原於塑膠模具凸面，唯此方法需要先將晶種Sn離子固定於塑膠模具凸面，本研究選用之塑膠模具無法與Sn離子產生鍵結，故無法選區還原銀離子於特定區域。以金當作擋光層之塑膠混合模具作法是利用金屬或金顆粒轉印技術，得到負型塑膠混合模具(擋光層在凹槽)或正型塑膠混合模具(擋光層在凸面)。金層轉印技術可以成功轉印170 nm線寬圖案，轉印微奈米圖案面積可達1.5 cm × 1.5 cm；金粒子轉印技術可以成功轉印100 nm圖案，轉印800 nm直線面積可達直徑4 cm之圓。此外，研究中發現退火150℃兩小時會讓緊鄰的金粒子產生連結現象。另一方面，研究規則孔洞排列薄膜擬當作模具使用，利用自行合成的二氧化矽膠體溶液與Poly(St-BA-AA)混摻製作大面積、規則孔洞排列薄膜，孔洞孔徑約340 nm，孔徑間距約為404 nm，深度約2.18 nm。壓印製程之開發方面，重點在研發水性壓印製程，並利用水性壓印製程開發有機、無機複合材料之壓印。傳統壓印製程中使用有機溶劑、需高溫高壓及材料受限等缺點在水性壓印製程中可一併得到改善與解決。水性壓印利用水為溶劑，可廣泛搭配熱塑性、熱固性及凝膠材料等，甚至可以應用於有機無機複合材料圖案之壓印，結果顯示利用Epoxy混摻1wt%在鹼催化水解的TEOS壓印800 nm直線圖案，可以增加原始Epoxy圖案的穿透度。水性壓印製程不僅符合綠色製程還有另一項特點，在適當壓印參數控制下可以製作微米級無殘餘層圖案。最後在壓印材料之開發方面，本研究利用可分段照光聚合之新型UV阻劑，壓印多層次結構。結果顯示新型UV阻劑可以有效提升多層級結構第二層的深度(~523.6 nm)且不損毀底層圖案。 The study focusing on the development of nano/micro imprinting techniques and their applications included three major parts: fabrication of imprinted molds, development of alternative imprinting process, and design of imprintable materials.Two imprinting molds were fabricated: one was plastic hybrid mold and the other was ordered porous mold. In the building of plastic hybrid mold, a design using the protruded area with a thin layer of metal to mask the UV light to prepare a residual layer-free pattern. Three materials were tested as the masking layers: carbon black, electroless plated silver, and deposited gold. As limited in the size of carbon black, the plastic hybrid mold with more than 20 um lines was successfully fabricated. Another silver deposition on the protruded area was achieved by immobilizing a layer of tin salt as a reduction coating. However, the tin layer did not homogeneously and selectively bind to the protruded area of plastic molds, giving a failure deposition on the molds. The direct metal transfer techniques was conducted by using different adhesion work for those contact interfaces to stick and remove the protruded gold layer (negative type) or leave the protruded gold layer (negative type). The metal layer transfer was achieved for a 170 nm featured pattern in a 1.5 cm × 1.5 cm area, while the gold particle transfer technique was able to transfer few hundreds nanometer featured pattern in area of 4 cm diameter. Sintering process at a low temperature (150℃) was performed to stable the layered gold nanoparticles on the protruded area. However, heterogeneous distribution of particles was found after 2 hr of sintering. On the other hand, an ordered, self-assembly of composite film was prepared as a nanoporous mold. We synthesized poly(St-BA-AA) emulsion to blend with silica sol prior to coat and dry the composite, giving a large-areaed polymer film with ordered nanopore arrays with 340 nm of pore diameter, 400 nm of spacing, and 2.2 nm of depth.As for the development of imprinting process, we designed a novel water-based imprint process and its application to imprint an organic/inorganic composite. The process is available for imprinting variety of polymers which can be dispersed or emulsified in water, without using organic solvent, high temperature, heavy pressure. A recipe was tested as a water-based Epoxy prepolymer blended with base-catalyzed tetraethoxysilane precursor, giving a transparent 800nm featured pattern. Another test was conducted to fabricate a nonresidual layered pattern, owing to low viscosity of water-based imprintable recipe. In the design of imprintable materials, a novel UV-curable resist was explored for its two staged irradiation and curing. Using the UV resist, the hierarchical structure was able to build up and its depth was increased to ~523.6 nm without collapse the first micron featured pattern.

微奈米壓印用之塑膠模具及壓印材料之開發 = Development of plastic molds and imprinted materials for micro/nano imprint lithography
許, 淑涵

微奈米壓印用之塑膠模具及壓印材料之開發 = Development of plastic molds and imprinted materials for micro/nano imprint lithography / 許淑涵撰 - [高雄市] : 撰者, 2009[民98]. - 166面 ; 圖、表 ; 30公分.
指導教授：鍾宜璋參考書目：面.
塑膠混合模具hierarchical structure

微奈米壓印用之塑膠模具及壓印材料之開發 = Development of plastic molds and imprinted materials for micro/nano imprint lithography
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