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Principles of physical vapor deposit...
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SreeHarsha, K. S.
Principles of physical vapor deposition of thin films
Record Type:
Electronic resources : Monograph/item
Title/Author:
Principles of physical vapor deposition of thin filmsK.S. Sree Harsha.
Author:
SreeHarsha, K. S.
Published:
Amsterdam ;Elsevier,2006.
Description:
1 online resource (xi, 1160 p.) :ill.
Subject:
Thin films.
Online resource:
http://www.sciencedirect.com/science/book/9780080446998
ISBN:
9780080446998
Principles of physical vapor deposition of thin films
SreeHarsha, K. S.
Principles of physical vapor deposition of thin films
[electronic resource] /K.S. Sree Harsha. - 1st ed. - Amsterdam ;Elsevier,2006. - 1 online resource (xi, 1160 p.) :ill.
Includes bibliographical references and index.
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
ISBN: 9780080446998
Source: 112953:113041Elsevier Science & Technologyhttp://www.sciencedirect.comSubjects--Topical Terms:
203678
Thin films.
Index Terms--Genre/Form:
214472
Electronic books.
LC Class. No.: QC176.83 / .S68 2006eb
Dewey Class. No.: 621.38152
Principles of physical vapor deposition of thin films
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K.S. Sree Harsha.
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1st ed.
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Amsterdam ;
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Boston ;
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Elsevier,
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2006.
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1 online resource (xi, 1160 p.) :
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ill.
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Includes bibliographical references and index.
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The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
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Description based on print version record.
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Print version:
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SreeHarsha, K. S.
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Principles of physical vapor deposition of thin films.
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1st ed.
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Amsterdam ; Boston ; London : Elsevier, 2006
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008044699X
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9780080446998
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(DLC) 2005937842
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ScienceDirect
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http://www.sciencedirect.com/science/book/9780080446998
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電子館藏
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000000076973
電子館藏
1圖書
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EB QC176.83 S68 2006eb 2006
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0
1 records • Pages 1 •
1
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http://www.sciencedirect.com/science/book/9780080446998
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