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PVD for microelectronicssputter depo...
~
Powell, Ronald A.
PVD for microelectronicssputter deposition applied to semiconductor manufacturing /
Record Type:
Electronic resources : Monograph/item
Title/Author:
PVD for microelectronicsRonald A. Powell, Stephen M. Rossnagel.
Reminder of title:
sputter deposition applied to semiconductor manufacturing /
Author:
Powell, Ronald A.
other author:
Rossnagel, Stephen M.
Published:
San Diego :Academic Press,c1999.
Description:
xiii, 419 p. :ill. ;24 cm.
Subject:
Thin film devicesDesign and construction.
Online resource:
http://www.sciencedirect.com/science/book/9780125330268
ISBN:
9780125330268 (electronic bk.)
PVD for microelectronicssputter deposition applied to semiconductor manufacturing /
Powell, Ronald A.
PVD for microelectronics
sputter deposition applied to semiconductor manufacturing /[electronic resource] :Ronald A. Powell, Stephen M. Rossnagel. - San Diego :Academic Press,c1999. - xiii, 419 p. :ill. ;24 cm. - Thin films ;v. 26 . - Thin films (San Diego, Calif.) ;v. 28..
Includes bibliographical references and indexes.
ISBN: 9780125330268 (electronic bk.) Subjects--Topical Terms:
203677
Thin film devices
--Design and construction.
LC Class. No.: QC176.A1 / P53 v.26
Dewey Class. No.: 621.3815/2
PVD for microelectronicssputter deposition applied to semiconductor manufacturing /
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sputter deposition applied to semiconductor manufacturing /
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http://www.sciencedirect.com/science/book/9780125330268
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EB QC176.A1 P53 v.26 c1999
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http://www.sciencedirect.com/science/book/9780125330268
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