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New approaches to image processing b...

Gur, Eran.

New approaches to image processing based failure analysis of nano-scale ULSI devices

Record Type:	Electronic resources : Monograph/item
Title/Author:	New approaches to image processing based failure analysis of nano-scale ULSI devicesZeev Zalevsky, Pavel Livshits, Eran Gur.
Author:	Zalevsky, Zeev.
other author:	Livshits, Pavel.
Published:	Amsterdam :Elsevier/William Andrew,2014.
Description:	101 p. :ill. ;23 cm.
Subject:	Integrated circuitsUltra large scale integration
Online resource:	http://www.sciencedirect.com/science/book/9780323241434
ISBN:	9780323241434 (electronic bk.)

New approaches to image processing based failure analysis of nano-scale ULSI devices
Zalevsky, Zeev.

New approaches to image processing based failure analysis of nano-scale ULSI devices[electronic resource] /Zeev Zalevsky, Pavel Livshits, Eran Gur. - Amsterdam :Elsevier/William Andrew,2014. - 101 p. :ill. ;23 cm. - Micro & nano technologies series. - Micro & nano technologies..

Includes bibliographical references.

New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can't keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise.

ISBN: 9780323241434 (electronic bk.)Subjects--Topical Terms:

667666
Integrated circuits
--Ultra large scale integration

LC Class. No.: TK7874.76 / .Z384 2014

Dewey Class. No.: 621.4

New approaches to image processing based failure analysis of nano-scale ULSI devices
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520 $a New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can't keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise.
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