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Optimisation of ZnO thin filmsimplan...
~
Chakrabarti, Subhananda.
Optimisation of ZnO thin filmsimplants, properties, and device fabrication /
Record Type:
Electronic resources : Monograph/item
Title/Author:
Optimisation of ZnO thin filmsby Saurabh Nagar, Subhananda Chakrabarti.
Reminder of title:
implants, properties, and device fabrication /
Author:
Nagar, Saurabh.
other author:
Chakrabarti, Subhananda.
Published:
Singapore :Springer Singapore :2017.
Description:
xix, 83 p. :ill. (some col.), digital ;24 cm.
Contained By:
Springer eBooks
Subject:
Zinc oxide thin films.
Online resource:
http://dx.doi.org/10.1007/978-981-10-0809-2
ISBN:
9789811008092$q(electronic bk.)
Optimisation of ZnO thin filmsimplants, properties, and device fabrication /
Nagar, Saurabh.
Optimisation of ZnO thin films
implants, properties, and device fabrication /[electronic resource] :by Saurabh Nagar, Subhananda Chakrabarti. - Singapore :Springer Singapore :2017. - xix, 83 p. :ill. (some col.), digital ;24 cm.
Introduction -- Optimisation of PLD Parameters -- Implantation Studies -- Fabrication of Optoelectronics Devices -- Summary and Future Works.
This monograph describes the different implantation mechanisms which can be used to achieve strong, reliable and stable p-type ZnO thin films. The results will prove useful in the field of optoelectronics in the UV region. This book will prove useful to research scholars and professionals working on doping and implantation of ZnO thin films and subsequently fabricating optoelectronic devices. The first chapter of the monograph emphasises the importance of ZnO in the field of optoelectronics for ultraviolet (UV) region and also discusses the material, electronic and optical properties of ZnO. The book then goes on to discuss the optimization of pulsed laser deposited (PLD) ZnO thin films in order to make successful p-type films. This can enable achievement of high optical output required for high-efficiency devices. The book also discusses a hydrogen implantation study on the optimized films to confirm whether the implantation leads to improvement in the optimized results.
ISBN: 9789811008092$q(electronic bk.)
Standard No.: 10.1007/978-981-10-0809-2doiSubjects--Topical Terms:
405103
Zinc oxide thin films.
LC Class. No.: TA418.9.T45
Dewey Class. No.: 621.38152
Optimisation of ZnO thin filmsimplants, properties, and device fabrication /
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Introduction -- Optimisation of PLD Parameters -- Implantation Studies -- Fabrication of Optoelectronics Devices -- Summary and Future Works.
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This monograph describes the different implantation mechanisms which can be used to achieve strong, reliable and stable p-type ZnO thin films. The results will prove useful in the field of optoelectronics in the UV region. This book will prove useful to research scholars and professionals working on doping and implantation of ZnO thin films and subsequently fabricating optoelectronic devices. The first chapter of the monograph emphasises the importance of ZnO in the field of optoelectronics for ultraviolet (UV) region and also discusses the material, electronic and optical properties of ZnO. The book then goes on to discuss the optimization of pulsed laser deposited (PLD) ZnO thin films in order to make successful p-type films. This can enable achievement of high optical output required for high-efficiency devices. The book also discusses a hydrogen implantation study on the optimized films to confirm whether the implantation leads to improvement in the optimized results.
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Chemistry and Materials Science (Springer-11644)
based on 0 review(s)
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EB TA418.9.T45 N147 2017
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http://dx.doi.org/10.1007/978-981-10-0809-2
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