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Tantalum and niobium-based capacitor...
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Freeman, Yuri.
Tantalum and niobium-based capacitorsscience, technology, and applications /
Record Type:
Electronic resources : Monograph/item
Title/Author:
Tantalum and niobium-based capacitorsby Yuri Freeman.
Reminder of title:
science, technology, and applications /
Author:
Freeman, Yuri.
Published:
Cham :Springer International Publishing :2018.
Description:
xix, 120 p. :ill., digital ;24 cm.
Contained By:
Springer eBooks
Subject:
Capacitors.
Online resource:
http://dx.doi.org/10.1007/978-3-319-67870-2
ISBN:
9783319678702$q(electronic bk.)
Tantalum and niobium-based capacitorsscience, technology, and applications /
Freeman, Yuri.
Tantalum and niobium-based capacitors
science, technology, and applications /[electronic resource] :by Yuri Freeman. - Cham :Springer International Publishing :2018. - xix, 120 p. :ill., digital ;24 cm.
Introduction -- Chap1: Major Degradation Mechanisms -- Chap2: Basic Technology -- Chap3: Applications -- Conclusion.
This book provides a comprehensive analysis of the science, technology, and applications of Tantalum and Niobium-based capacitors. The author discusses fundamentals, focusing on thermodynamic stability, major degradation processes and conduction mechanisms in the basic structure of Me-Me2O5-cathode (Me: Ta, Nb) Technology-related coverage includes chapters technology chapters on the major manufacturing steps from capacitor grade powder to the testing of finished capacitors. Applications discussed include high reliability, high charge and energy efficiency, high working voltages, high temperatures, etc. The links between the scientific foundation, breakthrough technologies and outstanding performance and reliability of the capacitors are demonstrated. The theoretical models discussed include the thermodynamics of the amorphous dielectrics, conduction mechanisms in metal-insulator-semiconductor (MIS) structures, band diagrams of the organic semiconductors, etc. Provides a single-source reference to the science, technology, and applications of Tantalum and Niobium-based capacitors; Focuses on Polymer Tantalum capacitors, with rapidly growing applications in special and commercial electronics; Discusses in detail conduction and degradation mechanisms in amorphous dielectrics and multilayer capacitor structures with amorphous dielectrics, such as metal-insulator-semiconductor (MIS) structures with inorganic and organic semiconductors, as well as MOSFET transistors with high k dielectrics.
ISBN: 9783319678702$q(electronic bk.)
Standard No.: 10.1007/978-3-319-67870-2doiSubjects--Topical Terms:
238364
Capacitors.
LC Class. No.: TK7872.C65
Dewey Class. No.: 621.315
Tantalum and niobium-based capacitorsscience, technology, and applications /
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Introduction -- Chap1: Major Degradation Mechanisms -- Chap2: Basic Technology -- Chap3: Applications -- Conclusion.
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This book provides a comprehensive analysis of the science, technology, and applications of Tantalum and Niobium-based capacitors. The author discusses fundamentals, focusing on thermodynamic stability, major degradation processes and conduction mechanisms in the basic structure of Me-Me2O5-cathode (Me: Ta, Nb) Technology-related coverage includes chapters technology chapters on the major manufacturing steps from capacitor grade powder to the testing of finished capacitors. Applications discussed include high reliability, high charge and energy efficiency, high working voltages, high temperatures, etc. The links between the scientific foundation, breakthrough technologies and outstanding performance and reliability of the capacitors are demonstrated. The theoretical models discussed include the thermodynamics of the amorphous dielectrics, conduction mechanisms in metal-insulator-semiconductor (MIS) structures, band diagrams of the organic semiconductors, etc. Provides a single-source reference to the science, technology, and applications of Tantalum and Niobium-based capacitors; Focuses on Polymer Tantalum capacitors, with rapidly growing applications in special and commercial electronics; Discusses in detail conduction and degradation mechanisms in amorphous dielectrics and multilayer capacitor structures with amorphous dielectrics, such as metal-insulator-semiconductor (MIS) structures with inorganic and organic semiconductors, as well as MOSFET transistors with high k dielectrics.
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EB TK7872.C65 F855 2018 2018.
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http://dx.doi.org/10.1007/978-3-319-67870-2
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