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Physical design and mask synthesis f...

Shim, Seongbo.

Physical design and mask synthesis for directed self-assembly lithography

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Physical design and mask synthesis for directed self-assembly lithographyby Seongbo Shim, Youngsoo Shin.
作者:	Shim, Seongbo.
其他作者:	Shin, Youngsoo.
出版者:	Cham :Springer International Publishing :2018.
面頁冊數:	xiv, 138 p. :ill. (some col.), digital ;24 cm.
Contained By:	Springer eBooks
標題:	Integrated circuitsDesign and construction.
電子資源:	http://dx.doi.org/10.1007/978-3-319-76294-4
ISBN:	9783319762944$q(electronic bk.)

Physical design and mask synthesis for directed self-assembly lithography
Shim, Seongbo.

Physical design and mask synthesis for directed self-assembly lithography[electronic resource] /by Seongbo Shim, Youngsoo Shin. - Cham :Springer International Publishing :2018. - xiv, 138 p. :ill. (some col.), digital ;24 cm. - NanoScience and technology,1434-4904. - NanoScience and technology..

Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL.

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

ISBN: 9783319762944$q(electronic bk.)

Standard No.: 10.1007/978-3-319-76294-4doiSubjects--Topical Terms:

184690
Integrated circuits
--Design and construction.

LC Class. No.: TK7874 / .S556 2018

Dewey Class. No.: 621.3815

Physical design and mask synthesis for directed self-assembly lithography
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