國立高雄大學圖資館 |

Language: English

Back

Electrical atomic force microscopy f...

Celano, Umberto.

Electrical atomic force microscopy for nanoelectronics

Record Type:	Electronic resources : Monograph/item
Title/Author:	Electrical atomic force microscopy for nanoelectronicsedited by Umberto Celano.
other author:	Celano, Umberto.
Published:	Cham :Springer International Publishing :2019.
Description:	xx, 408 p. :ill., digital ;24 cm.
Contained By:	Springer eBooks
Subject:	Atomic force microscopy.
Online resource:	https://doi.org/10.1007/978-3-030-15612-1
ISBN:	9783030156121$q(electronic bk.)

Electrical atomic force microscopy for nanoelectronics
Electrical atomic force microscopy for nanoelectronics[electronic resource] /edited by Umberto Celano. - Cham :Springer International Publishing :2019. - xx, 408 p. :ill., digital ;24 cm. - NanoScience and technology,1434-4904. - NanoScience and technology..

Introduction (U. Celano, W. Vandervorst) -- Conductive AFM for nanoscale analysis of high-k dielectric metal oxides (C. Rodenbücher, M. Wojtyniak, K. Szot) -- Mapping Conductance and Carrier Distribution in Confined Three-Dimensional Transistor Structures (A. Schulze, P. Eyben, K. Paredis, L. Wouters, U. Celano, W. Vandervorst) -- Scanning Capacitance Microscopy for two-dimensional carrier profiling of semiconductor devices (J. Mody, J. Nxumalo) -- Scanning probe lithography for nanopatterning and fabrication of high-resolution devices (Y. K. Ryu, A. W. Knoll) -- Characterizing Ferroelectricity with an Atomic Force Microscopy: an all-around technique (S. Martin, B. Gautier, N. Baboux, A. Gruvermann, A. Carretero-Genevrier, M. Gich, A. Gomez) -- Electrical AFM for the analysis of Resistive Switching (S. Brivio, J. Frascaroli, M. H. Lee) -- Magnetic force microscopy for magnetic recording and devices (A. Hirohata, M. Samiepour, M. Corbetta) -- Nanoscale space charge density profiling with KPFM and photoconductive C-AFM/KPFM (C. Villeneuve-Faure, K. Makasheva, L. Boudou, G. Teyssedre) -- Electrical AFM of 2D materials and heterostructures for nanoelectronics (F. Giannazzo, G. Greco, F. Roccaforte, C. Mahata, M. Lanza) -- Diamond probes technology (T. Hantschel, T. Conard, J. Kilpatrick, G. Cross) -- Scanning Microwave Impedance Microscopy (sMIM) in electronic materials and quantum materials (K. Rubin, Y. Yang, O. Amster, D. Scrymgeour, S. Misra)

The tremendous impact of electronic devices on our lives is the result of continuous improvements of the billions of nanoelectronic components inside integrated circuits (ICs) However, ultra-scaled semiconductor devices require nanometer control of the many parameters essential for their fabrication. Through the years, this created a strong alliance between microscopy techniques and IC manufacturing. This book reviews the latest progress in IC devices, with emphasis on the impact of electrical atomic force microscopy (AFM) techniques for their development. The operation principles of many techniques are introduced, and the associated metrology challenges described. Blending the expertise of industrial specialists and academic researchers, the chapters are dedicated to various AFM methods and their impact on the development of emerging nanoelectronic devices. The goal is to introduce the major electrical AFM methods, following the journey that has seen our lives changed by the advent of ubiquitous nanoelectronics devices, and has extended our capability to sense matter on a scale previously inaccessible.

ISBN: 9783030156121$q(electronic bk.)

Standard No.: 10.1007/978-3-030-15612-1doiSubjects--Topical Terms:

189132
Atomic force microscopy.

LC Class. No.: QH212.A78 / E443 2019

Dewey Class. No.: 502.81

Electrical atomic force microscopy for nanoelectronics
LDR:03655nmm a2200349 a 4500 001 563625
003 DE-He213
005 20191129163221.0
006 m d
007 cr nn 008maaau
008 200311s2019 gw s 0 eng d
020 $a 9783030156121$q(electronic bk.)
020 $a 9783030156114$q(paper)
024 7 $a 10.1007/978-3-030-15612-1 $2 doi
035 $a 978-3-030-15612-1
040 $a GP $c GP
041 0 $a eng
050 4 $a QH212.A78 $b E443 2019
072 7 $a PNFS $2 bicssc
072 7 $a SCI078000 $2 bisacsh
072 7 $a PNFS $2 thema
072 7 $a PDN $2 thema
082 0 4 $a 502.81 $2 23
090 $a QH212.A78 $b E38 2019
245 0 0 $a Electrical atomic force microscopy for nanoelectronics $h [electronic resource] / $c edited by Umberto Celano.
260 $a Cham : $b Springer International Publishing : $b Imprint: Springer, $c 2019.
300 $a xx, 408 p. : $b ill., digital ; $c 24 cm.
490 1 $a NanoScience and technology, $x 1434-4904
505 0 $a Introduction (U. Celano, W. Vandervorst) -- Conductive AFM for nanoscale analysis of high-k dielectric metal oxides (C. Rodenbücher, M. Wojtyniak, K. Szot) -- Mapping Conductance and Carrier Distribution in Confined Three-Dimensional Transistor Structures (A. Schulze, P. Eyben, K. Paredis, L. Wouters, U. Celano, W. Vandervorst) -- Scanning Capacitance Microscopy for two-dimensional carrier profiling of semiconductor devices (J. Mody, J. Nxumalo) -- Scanning probe lithography for nanopatterning and fabrication of high-resolution devices (Y. K. Ryu, A. W. Knoll) -- Characterizing Ferroelectricity with an Atomic Force Microscopy: an all-around technique (S. Martin, B. Gautier, N. Baboux, A. Gruvermann, A. Carretero-Genevrier, M. Gich, A. Gomez) -- Electrical AFM for the analysis of Resistive Switching (S. Brivio, J. Frascaroli, M. H. Lee) -- Magnetic force microscopy for magnetic recording and devices (A. Hirohata, M. Samiepour, M. Corbetta) -- Nanoscale space charge density profiling with KPFM and photoconductive C-AFM/KPFM (C. Villeneuve-Faure, K. Makasheva, L. Boudou, G. Teyssedre) -- Electrical AFM of 2D materials and heterostructures for nanoelectronics (F. Giannazzo, G. Greco, F. Roccaforte, C. Mahata, M. Lanza) -- Diamond probes technology (T. Hantschel, T. Conard, J. Kilpatrick, G. Cross) -- Scanning Microwave Impedance Microscopy (sMIM) in electronic materials and quantum materials (K. Rubin, Y. Yang, O. Amster, D. Scrymgeour, S. Misra)
520 $a The tremendous impact of electronic devices on our lives is the result of continuous improvements of the billions of nanoelectronic components inside integrated circuits (ICs) However, ultra-scaled semiconductor devices require nanometer control of the many parameters essential for their fabrication. Through the years, this created a strong alliance between microscopy techniques and IC manufacturing. This book reviews the latest progress in IC devices, with emphasis on the impact of electrical atomic force microscopy (AFM) techniques for their development. The operation principles of many techniques are introduced, and the associated metrology challenges described. Blending the expertise of industrial specialists and academic researchers, the chapters are dedicated to various AFM methods and their impact on the development of emerging nanoelectronic devices. The goal is to introduce the major electrical AFM methods, following the journey that has seen our lives changed by the advent of ubiquitous nanoelectronics devices, and has extended our capability to sense matter on a scale previously inaccessible.
650 0 $a Atomic force microscopy. $3 189132
650 0 $a Nanoelectronics. $3 308072
650 1 4 $a Spectroscopy and Microscopy. $3 376485
650 2 4 $a Characterization and Evaluation of Materials. $3 273978
650 2 4 $a Electronics and Microelectronics, Instrumentation. $3 274412
650 2 4 $a Optical and Electronic Materials. $3 274099
650 2 4 $a Nanoscale Science and Technology. $3 489389
650 2 4 $a Nanotechnology. $3 193873
700 1 $a Celano, Umberto. $3 750437
710 2 $a SpringerLink (Online service) $3 273601
773 0 $t Springer eBooks
830 0 $a NanoScience and technology. $3 559542
856 4 0 $u https://doi.org/10.1007/978-3-030-15612-1
950 $a Chemistry and Materials Science (Springer-11644)