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Laser heat-mode lithographyprinciple and methods /

Record Type:	Electronic resources : Monograph/item
Title/Author:	Laser heat-mode lithographyby Jingsong Wei.
Reminder of title:	principle and methods /
Author:	Wei, Jingsong.
Published:	Singapore :Springer Singapore :2019.
Description:	xiii, 208 p. :ill., digital ;24 cm.
Contained By:	Springer eBooks
Subject:	Lithography.
Online resource:	https://doi.org/10.1007/978-981-15-0943-8
ISBN:	9789811509438$q(electronic bk.)

Laser heat-mode lithographyprinciple and methods /
Wei, Jingsong.

Laser heat-mode lithographyprinciple and methods /[electronic resource] :by Jingsong Wei. - Singapore :Springer Singapore :2019. - xiii, 208 p. :ill., digital ;24 cm. - Springer series in materials science,v.2910933-033X ;. - Springer series in materials science ;v. 62..

Current status of lithography -- Principles of laser heat-mode lithography and thermal diffusion -- Laser heat-mode maskless lithography system -- Manipulation of thermal diffusion channels -- Laser heat-mode nanolithography on phase-change thin films -- Direct laser heat-mode nanopatterning on metallo-organic compound thin films -- Laser heat-mode patterning of transparent thin films -- Laser heat-mode grayscale image lithography -- Patterns transfer processes and applications.

This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength. Laser heat-mode lithography techniques greatly simplify production procedures because they require neither a particular light source nor a particular environment; further, there are no pre-baking and post-baking steps required for organic photoresists. The pattern feature size can be either larger or smaller than the laser spot by adjusting the writing strategy. The lithographic feature size can also be arbitrarily tuned from nanoscale to micrometer without changing the laser spot size. Lastly, the line edge roughness can be controlled at a very low value because the etching process is a process of breaking bonds among atoms. The book offers an invaluable reference guide for all advanced undergraduates, graduate students, researchers and engineers working in the fields of nanofabrication, lithography techniques and systems, phase change materials, etc.

ISBN: 9789811509438$q(electronic bk.)

Standard No.: 10.1007/978-981-15-0943-8doiSubjects--Topical Terms:

737670
Lithography.

LC Class. No.: TP156.E68 / W45 2019

Dewey Class. No.: 686.2315

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505 0 $a Current status of lithography -- Principles of laser heat-mode lithography and thermal diffusion -- Laser heat-mode maskless lithography system -- Manipulation of thermal diffusion channels -- Laser heat-mode nanolithography on phase-change thin films -- Direct laser heat-mode nanopatterning on metallo-organic compound thin films -- Laser heat-mode patterning of transparent thin films -- Laser heat-mode grayscale image lithography -- Patterns transfer processes and applications.
520 $a This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength. Laser heat-mode lithography techniques greatly simplify production procedures because they require neither a particular light source nor a particular environment; further, there are no pre-baking and post-baking steps required for organic photoresists. The pattern feature size can be either larger or smaller than the laser spot by adjusting the writing strategy. The lithographic feature size can also be arbitrarily tuned from nanoscale to micrometer without changing the laser spot size. Lastly, the line edge roughness can be controlled at a very low value because the etching process is a process of breaking bonds among atoms. The book offers an invaluable reference guide for all advanced undergraduates, graduate students, researchers and engineers working in the fields of nanofabrication, lithography techniques and systems, phase change materials, etc.
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