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Pattern recognition and artificial i...

(1998 :)

Pattern recognition and artificial intelligenceinternational conference, ICPRAI 2020, Zhongshan, China, October 19-23, 2020 : proceedings /

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Pattern recognition and artificial intelligenceedited by Yue Lu ... [et al.].
其他題名:	international conference, ICPRAI 2020, Zhongshan, China, October 19-23, 2020 : proceedings /
其他題名:	ICPRAI 2020
其他作者:	Lu, Yue.
團體作者:
出版者:	Cham :Springer International Publishing :2020.
面頁冊數:	xx, 741 p. :ill., digital ;24 cm.
Contained By:	Springer Nature eBook
標題:	Artificial intelligence
電子資源:	https://doi.org/10.1007/978-3-030-59830-3
ISBN:	9783030598303$q(electronic bk.)

Pattern recognition and artificial intelligenceinternational conference, ICPRAI 2020, Zhongshan, China, October 19-23, 2020 : proceedings /
Pattern recognition and artificial intelligenceinternational conference, ICPRAI 2020, Zhongshan, China, October 19-23, 2020 : proceedings /[electronic resource] :ICPRAI 2020edited by Yue Lu ... [et al.]. - Cham :Springer International Publishing :2020. - xx, 741 p. :ill., digital ;24 cm. - Lecture notes in computer science,120680302-9743 ;. - Lecture notes in computer science ;4891..

This book constitutes the proceedings of the Second International Conference on Pattern Recognition and Artificial Intelligence, ICPRAI 2020, which took place in Zhongshan, China, in October 2020. The 49 full and 14 short papers presented were carefully reviewed and selected for inclusion in the book. The papers were organized in topical sections as follows: handwriting and text processing; features and classifiers; deep learning; computer vision and image processing; medical imaging and applications; and forensic studies and medical diagnosis.

ISBN: 9783030598303$q(electronic bk.)

Standard No.: 10.1007/978-3-030-59830-3doiSubjects--Topical Terms:

252958
Artificial intelligence

LC Class. No.: Q334 / .I58 2020

Dewey Class. No.: 006.3

Pattern recognition and artificial intelligenceinternational conference, ICPRAI 2020, Zhongshan, China, October 19-23, 2020 : proceedings /
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