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有關四閘極金半場效電晶體和四閘極具負交疊通道金氧半場效電晶體之次臨界行為...
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國立高雄大學電機工程學系碩博士班
有關四閘極金半場效電晶體和四閘極具負交疊通道金氧半場效電晶體之次臨界行為及其應用於次臨界邏輯電路之解析模型 = Analytical Subthreshold Behavior Model of Quadruple-Gate MESFETs and Quadruple -Gate Underlap MOSFETs and Its Application for the Evaluation of Subthreshold Logic Gate
Record Type:
Language materials, printed : monographic
Paralel Title:
Analytical Subthreshold Behavior Model of Quadruple-Gate MESFETs and Quadruple -Gate Underlap MOSFETs and Its Application for the Evaluation of Subthreshold Logic Gate
Author:
林于揚,
Secondary Intellectual Responsibility:
國立高雄大學
Place of Publication:
高雄市
Published:
國立高雄大學;
Year of Publication:
2023[民112]
Description:
xi,100葉圖 : 30公分;
Subject:
漂移擴散法
Subject:
Drift-diffusion
Online resource:
https://handle.ncl.edu.tw/11296/3hv9jd
Notes:
112年12月1日公開
Notes:
參考書目: 葉96-98
有關四閘極金半場效電晶體和四閘極具負交疊通道金氧半場效電晶體之次臨界行為及其應用於次臨界邏輯電路之解析模型 = Analytical Subthreshold Behavior Model of Quadruple-Gate MESFETs and Quadruple -Gate Underlap MOSFETs and Its Application for the Evaluation of Subthreshold Logic Gate
林, 于揚
有關四閘極金半場效電晶體和四閘極具負交疊通道金氧半場效電晶體之次臨界行為及其應用於次臨界邏輯電路之解析模型
= Analytical Subthreshold Behavior Model of Quadruple-Gate MESFETs and Quadruple -Gate Underlap MOSFETs and Its Application for the Evaluation of Subthreshold Logic Gate / 林于揚撰 - 高雄市 : 國立高雄大學, 2023[民112]. - xi,100葉 ; 圖 ; 30公分.
112年12月1日公開參考書目: 葉96-98.
漂移擴散法Drift-diffusion
有關四閘極金半場效電晶體和四閘極具負交疊通道金氧半場效電晶體之次臨界行為及其應用於次臨界邏輯電路之解析模型 = Analytical Subthreshold Behavior Model of Quadruple-Gate MESFETs and Quadruple -Gate Underlap MOSFETs and Its Application for the Evaluation of Subthreshold Logic Gate
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