Advances in CMP/polishing technologi...
Doi, Toshiro.

 

  • Advances in CMP/polishing technologies for the manufacture of electronic devices
  • Record Type: Electronic resources : Monograph/item
    Title/Author: Advances in CMP/polishing technologies for the manufacture of electronic devicesedited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.
    other author: Doi, Toshiro.
    Published: Oxford :William Andrew,2012.
    Description: 1 online resource (xii, 317 p.)
    Notes: Includes index.
    Subject: Electrolytic polishing.
    Online resource: http://www.sciencedirect.com/science/book/9781437778595
    ISBN: 9781437778595
Items
  • 1 records • Pages 1 •
  • 1 records • Pages 1 •
Reviews
Export
pickup library
 
 
Change password
Login