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鐵電記憶元件在多晶系薄膜電晶體上的製備 = Fabrication of...
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國立中山大學電機工程學系
鐵電記憶元件在多晶系薄膜電晶體上的製備 = Fabrication of Ferroelectric Memory Devices on Top-gated Polycrystalline Sillicon Thin-Film Transistors
Record Type:
Language materials, printed : monographic
Paralel Title:
Fabrication of Ferroelectric Memory Devices on Top-gated Polycrystalline Sillicon Thin-Film Transistors
Author:
陳志聖,
Secondary Intellectual Responsibility:
國立中山大學
Place of Publication:
[高雄市]
Published:
撰者;
Year of Publication:
2007[民96]
Description:
127面圖,表 : 30公分;
Subject:
鐵電
Subject:
ferroelectric
Notes:
參考書目:面61-69
鐵電記憶元件在多晶系薄膜電晶體上的製備 = Fabrication of Ferroelectric Memory Devices on Top-gated Polycrystalline Sillicon Thin-Film Transistors
陳, 志聖
鐵電記憶元件在多晶系薄膜電晶體上的製備
= Fabrication of Ferroelectric Memory Devices on Top-gated Polycrystalline Sillicon Thin-Film Transistors / 陳志聖撰 - [高雄市] : 撰者, 2007[民96]. - 127面 ; 圖,表 ; 30公分.
參考書目:面61-69.
鐵電ferroelectric
鐵電記憶元件在多晶系薄膜電晶體上的製備 = Fabrication of Ferroelectric Memory Devices on Top-gated Polycrystalline Sillicon Thin-Film Transistors
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博碩士論文區(二樓)
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1 records • Pages 1 •
1
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Attachments
310002516600
博碩士論文區(二樓)
不外借資料
學位論文
TH 008M/0009 542201 7541 2007
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1 records • Pages 1 •
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