鐵電記憶元件在多晶系薄膜電晶體上的製備 = Fabrication of...
國立中山大學電機工程學系

 

  • 鐵電記憶元件在多晶系薄膜電晶體上的製備 = Fabrication of Ferroelectric Memory Devices on Top-gated Polycrystalline Sillicon Thin-Film Transistors
  • Record Type: Language materials, printed : monographic
    Paralel Title: Fabrication of Ferroelectric Memory Devices on Top-gated Polycrystalline Sillicon Thin-Film Transistors
    Author: 陳志聖,
    Secondary Intellectual Responsibility: 國立中山大學
    Place of Publication: [高雄市]
    Published: 撰者;
    Year of Publication: 2007[民96]
    Description: 127面圖,表 : 30公分;
    Subject: 鐵電
    Subject: ferroelectric
    Notes: 參考書目:面61-69
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310002516600 博碩士論文區(二樓) 不外借資料 學位論文 TH 008M/0009 542201 7541 2007 一般使用(Normal) On shelf 0
  • 1 records • Pages 1 •
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