Plasma etching processes for CMOS de...
Posseme, Nicolas.

 

  • Plasma etching processes for CMOS device realization /
  • Record Type: Language materials, printed : Monograph/item
    Title/Author: Plasma etching processes for CMOS device realization /edited by Nicolas Posseme.
    other author: Posseme, Nicolas.
    Published: London :ISTE Press Ltd ;2017.
    Description: x, 121 p. :ill. ;24 cm.
    Subject: Metal oxide semiconductors, ComplementaryDesign and construction.
    ISBN: 1785480960 (hbk.)
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  • 1 records • Pages 1 •
 
320000709545 西方語文圖書區(四樓) 1圖書 一般圖書 TK7871.99.M44 P715 2017 新書使用(New Book) On shelf 0
  • 1 records • Pages 1 •
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