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Plasma etching processes for CMOS de...
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Posseme, Nicolas,
Plasma etching processes for CMOS device realization /
Record Type:
Electronic resources : Monograph/item
Title/Author:
Plasma etching processes for CMOS device realization /edited by Nicolas Posseme.
other author:
Posseme, Nicolas,
Description:
1 online resource (x, 121 pages) :illustrations
Subject:
Metal oxide semiconductors, Complementary.
Online resource:
https://www.sciencedirect.com/science/book/9781785480966
ISBN:
9780081011966$q(electronic bk.)
Plasma etching processes for CMOS device realization /
Plasma etching processes for CMOS device realization /
edited by Nicolas Posseme. - 1 online resource (x, 121 pages) :illustrations
Includes bibliographical references and index.
ISBN: 9780081011966$q(electronic bk.)Subjects--Topical Terms:
184467
Metal oxide semiconductors, Complementary.
Index Terms--Genre/Form:
214472
Electronic books.
LC Class. No.: TK7871.99.M44 / P63 2017
Dewey Class. No.: 621.39/732
Plasma etching processes for CMOS device realization /
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1785480960$q(print)
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Plasma etching processes for CMOS device realization /
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edited by Nicolas Posseme.
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London, UK :
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ISTE Press ;
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Kidlington, Oxford, UK :
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Elsevier,
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2017.
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1 online resource (x, 121 pages) :
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Includes bibliographical references and index.
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Metal oxide semiconductors, Complementary.
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184467
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Plasma etching.
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Posseme, Nicolas,
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https://www.sciencedirect.com/science/book/9781785480966
based on 0 review(s)
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電子館藏
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1 records • Pages 1 •
1
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000000172948
電子館藏
1圖書
電子書
EB TK7871.99.M44 P63 2017
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1 records • Pages 1 •
1
Multimedia
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https://www.sciencedirect.com/science/book/9781785480966
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