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Photoresist technology in microsystemsprinciples, processes and applications /

Record Type:	Electronic resources : Monograph/item
Title/Author:	Photoresist technology in microsystemsby Kaiying Wang.
Reminder of title:	principles, processes and applications /
Author:	Wang, Kaiying.
Published:	Singapore :Springer Nature Singapore :2025.
Description:	xii, 183 p. :ill., digital ;24 cm.
Contained By:	Springer Nature eBook
Subject:	Photoresists.
Online resource:	https://doi.org/10.1007/978-981-95-1606-3
ISBN:	9789819516063$q(electronic bk.)

Photoresist technology in microsystemsprinciples, processes and applications /
Wang, Kaiying.

Photoresist technology in microsystemsprinciples, processes and applications /[electronic resource] :by Kaiying Wang. - Singapore :Springer Nature Singapore :2025. - xii, 183 p. :ill., digital ;24 cm. - Springer series in advanced microelectronics,v. 152197-6643 ;. - Springer series in advanced microelectronics ;3..

1. Introduction to Photoresist Technology -- 2. Fundamentals of Photoresist Chemistry -- 3. Microsystems Fabrication Processes -- 4. Advanced Photoresist Materials for Microsystems -- 5. Photoresist Processing Techniques -- 6. Photoresist Applications in Microsystems -- 7. High-Aspect-Ratio Lithography for Microsystems -- 8. Challenges in Photoresist Technology for Microsystems -- 9. Emerging Trends in Photoresist Technology -- 10. Future Perspectives.

This book presents a comprehensive overview of recent advances in photoresist technology, a cornerstone of modern microfabrication. Photoresists enable the precise patterning essential for creating microelectronic devices, MEMS, biomedical systems, and photonic components. As the demand for smaller, faster, and more efficient microsystems grows, the role of photoresists in achieving high-resolution patterning and complex 3D structures has become increasingly critical. However, despite its importance, there is a lack of comprehensive resources that bridge the gap between the fundamental principles of photoresist chemistry, advanced fabrication techniques, and their diverse applications. This book addresses this gap by providing a unified and up to-date exploration of photoresist technology, making it a timely and essential contribution to the field. The book balances theoretical depth with practical insights, making it accessible to readers with varying levels of expertise. The book is designed to cater to a broad audience, from students and researchers to industry professionals. A unique feature of this book is its emphasis on the interplay between material properties, processing techniques, and application-specific requirements.

ISBN: 9789819516063$q(electronic bk.)

Standard No.: 10.1007/978-981-95-1606-3doiSubjects--Topical Terms:

737669
Photoresists.

LC Class. No.: TK7874

Dewey Class. No.: 621.381

Photoresist technology in microsystemsprinciples, processes and applications /
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505 0 $a 1. Introduction to Photoresist Technology -- 2. Fundamentals of Photoresist Chemistry -- 3. Microsystems Fabrication Processes -- 4. Advanced Photoresist Materials for Microsystems -- 5. Photoresist Processing Techniques -- 6. Photoresist Applications in Microsystems -- 7. High-Aspect-Ratio Lithography for Microsystems -- 8. Challenges in Photoresist Technology for Microsystems -- 9. Emerging Trends in Photoresist Technology -- 10. Future Perspectives.
520 $a This book presents a comprehensive overview of recent advances in photoresist technology, a cornerstone of modern microfabrication. Photoresists enable the precise patterning essential for creating microelectronic devices, MEMS, biomedical systems, and photonic components. As the demand for smaller, faster, and more efficient microsystems grows, the role of photoresists in achieving high-resolution patterning and complex 3D structures has become increasingly critical. However, despite its importance, there is a lack of comprehensive resources that bridge the gap between the fundamental principles of photoresist chemistry, advanced fabrication techniques, and their diverse applications. This book addresses this gap by providing a unified and up to-date exploration of photoresist technology, making it a timely and essential contribution to the field. The book balances theoretical depth with practical insights, making it accessible to readers with varying levels of expertise. The book is designed to cater to a broad audience, from students and researchers to industry professionals. A unique feature of this book is its emphasis on the interplay between material properties, processing techniques, and application-specific requirements.
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